A Critical Review on the Mineralogy and Processing for High-Grade Quartz
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REVIEW
A Critical Review on the Mineralogy and Processing for High-Grade Quartz Min Lin 1 & Ziyuan Liu 1 & Yan Wei 1 & Bin Liu 1 & Yu Meng 1 & Hang Qiu 1 & Shaomin Lei 2 & Xun Zhang 3 & Yubiao Li 2 Received: 25 February 2019 / Accepted: 9 June 2020 # Society for Mining, Metallurgy & Exploration Inc. 2020
Abstract High-purity quartz (SiO2) is an important material widely used in many industries, including semiconductor technology, telecommunication, and optics. The content and distribution of impurities in quartz significantly affect the processing methods. This paper provides an insightful review on the processing of high-purity quartz, covering the analytical techniques, separation methods, and the critical procedures used to assess the quality of quartz ore. More importantly, the critical review of the thermal phase transition separation method for fine-grained mineral inclusions, micron-grade fluid inclusions, and lattice-bound trace elements is notably opened for the first time. It is proposed that the research field as a monopolized industry would benefit by expounding the critical problems that occur during the preparation of high-purity quartz. Keywords High-purity quartz . Analysis technique . Fluid impurity . Lattice impurity
1 Introduction High-purity quartz (HPQ, SiO2) is an important material widely used in semiconductor technologies, high temperature lamp tubing, thin-film transistor-liquid crystal display (TFT-LCD), telecommunications, and optics [1]. Common quartz ores (vein quartz, quartz sandstone, etc.) inferior to crystal-grade quartz have been used to prepare HPQ owing to the exhaustion of high-grade quartz resources and a growing demand in the modern technology industries [2, 3]. However, common quartz ores usually contain various mineral and lattice impurities [4]. It is therefore necessary to combine physical (e.g., magnetic and flotation separation) and chemical (e.g., acid leaching) methods to remove these impurities [3, 5, 6]. For instance, it is very difficult to separate trace mica and feldspar from quartz ores by conventional
* Yubiao Li [email protected] 1
Wuhan BOE Optoelectronics Technology Co., Ltd., Wuhan 430040, People’s Republic of China
2
School of Resources and Environmental Engineering, Wuhan University of Technology, Wuhan 430070, People’s Republic of China
3
Jiangsu Kaida Quartz Co., Ltd., Xinyi 221400, People’s Republic of China
processing techniques due to their similar surface properties [7, 8]. The non-metallic element H, as a widely distributed impurity, exerts an extremely negative effect on the preparation of fused silica product [9–11]. Commonly, trace element H is mainly from the widely distributed fluid inclusions and Si–OH. However, the removal of H, especially those from micro fluid inclusions and atomic micro-cluster, has not been paid adequate attention [12, 13]. In addition to the nonmetallic elements (e.g., H, B, and P), certain amounts of metallic elements, such as Al, Fe, Ti, Ca, Mg, K, Na, and Li, can be found in quartz lattices [14–17]. Trad
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