A Nanoscale Modification of Materials at Thermoplasmonic Laser-Induced Backside Wet Etching of Sapphire
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A Nanoscale Modification of Materials at Thermoplasmonic Laser-Induced Backside Wet Etching of Sapphire O. M. Zhigalina 1,2 & D. N. Khmelenin 1 & A. V. Atanova 1 & N. V. Minaev 1 & A. P. Sviridov 1 & M. Yu. Tsvetkov 1 Received: 30 July 2019 / Accepted: 11 November 2019 # Springer Science+Business Media, LLC, part of Springer Nature 2019
Abstract Laser-induced backside wet etching using water solution of plasmon precursor (AgNO3) as an absorbing medium provides effective structuring of such a complex material as sapphire. At the same time, this process is accompanied by the formation of silver nanoparticles and a significant modification of a surface layer of sapphire. Hybrid plasmon structures are formed on the surface of sapphire. In this paper, the structure and phase composition of surface layer formed during the transformation of the materials in the process of etching have been studied using electron microscopy methods, electron diffraction, and EDX analysis; possibilities of creating of new plasmon nanostructures have been analyzed. Keywords Laser-induced backside wet etching (LIBWE) . Plasmonics . Microstructuring . Nanoparticles . Electron microscopy . EDX analysis
Introduction Significant progress in the creation of new functional materials was achieved in experiments on the interaction of laser radiation with the materials. This is determined mainly by the use of ultrashort pulse lasers and high-intensity radiation sources. Many works are dedicated to obtaining and modification of various nanoparticles (see, e.g., [1–5]). Experiments on laser ablation allowed establishing that femtosecond laser exposure induces phase transformations on the sample surface that change the medium structure [6, 7]. At the same time, such experiments are usually carried out using unique devices and require serious resources. In 1999, during studies of laser microstructuring, a method of indirect impact of laser radiation on the materials was proposed [8, 9]. In this process, high-intensity laser radiation focuses on the back surface of a transparent dielectric, which is located in a cell filled with highly absorbing liquid. A series of processes occur in the field of focus, on the sample/liquid interface: nonlinear absorption; absorption on defects;
* M. Yu. Tsvetkov [email protected] 1
Federal Scientific Research Centre “Crystallography and Photonics”, Russian Academy of Sciences, Moscow 119333, Russia
2
Bauman Moscow State Technical University, Moscow 105005, Russia
photochemical, thermal, and hydrodynamic processes; the formation of a supercritical fluids; cavitation; melting; evaporation; etc. [10–12]. These processes lead to the formation of a substantially localized area with extremely high temperature and pressure on a liquid/solid interface, and the accompanying strong pressure gradients at the same time contribute to the removal of the matter from the treatment area. The developed version of this technology was called laserinduced backside wet etching (LIBWE) [13]. This technology requires highly absorbent organ
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