Ag : Sb and Sb : Ag implantations into high purity silica
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Ag : Sb and Sb : Ag implantations into high purity silica T. S. Anderson, R. H. Magruder III, D. L. Kinser, and J. E. Wittig Department of Applied and Engineering Science, Vanderbilt University, Nashville, Tennessee 37235
R. A. Zuhr and D. K. Thomas Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 (Received 17 July 1996; accepted 8 August 1997)
Silica composites containing nanometer dimension colloids have been fabricated by implantation of Ag ions followed by Sb ions, and by implantation of Sb ions followed by Ag ions. Doses for the sequential element implantations were in ratios of 9 : 3 Ag : Sb and 3 : 9 Sb : Ag with the total dose held constant at 12 3 1016 ionsycm2 . Energies of implantation were 305 keV for the Ag ions and 320 keV for the Sb ions. Single element colloids were also fabricated by implantation of Ag or Sb using the same nominal dose and implantation energy of the sequential implantations. Approximately spherical particles were formed in all implanted samples. Microstructures of the nanoclusters in the various samples were markedly different. Selected area diffraction techniques revealed that alloyed phases of Ag–Sb were formed in some of the sequential implantations. The microstructure and the optical response of the nanocluster glass composites were found to be strongly dependent upon the order of the ion species implanted. The optical spectra of the 3 : 9 Sb : Ag sample displays two resonance peaks indicative of a Ag resonance peak and a resonance peak of an alloyed phase of Ag –Sb. Optical spectra for the 9 : 3 Ag : Sb sample displays two broad absorption peaks indicative of coated particles.
I. INTRODUCTION
Fabrication of nanometer dimension colloids in glass substrates by ion implantation has been a focus of research for the last two decades. Originally employed by Arnold and Borders to form Ag and Au colloids in silicate glasses,1 this technique has since been used to form many different types of colloids in a variety of substrates.2–5 The motive for this research is the fact that nanometer dimension colloid-glass composites exhibit potential for use as active optical waveguide devices.2,6,7 This potential coupled with the need for more efficient waveguide devices with formation techniques compatible with semiconductor processing establishes such composites as viable candidates for active optical devices. The microstructure of colloids formed in the host substrate is dependent upon the ion implantation parameters such as total dose, current density, and substrate temperature.8–10 It is also possible to control the depth of the implanted particles by the implantation energy.10 Post-implantation processing can be utilized to alter the size and size distribution of the metal colloids.1,2,11 This ability to control such aspects of colloid formation may make it possible to fabricate tailored colloid-glass composites. This paper reports the fabrication and characterization of nanometer dimension colloids formed in si
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