Amorphous and Microcrystalline Silicon

Processes used to grow hydrogenated amorphous silicon (a-Si:H) and microcrystalline silicon (μc-Si:H) from SiH4 and H2/SiH4 glow discharge plasmas are reviewed. Differences and similarities between growth reactions of a-Si:H and μc-Si:H in a plasma and on

  • PDF / 78,871,976 Bytes
  • 1,410 Pages / 547.146 x 686 pts Page_size
  • 96 Downloads / 249 Views

DOWNLOAD

REPORT


Springer Handbooks provide a concise compilation of approved key information on methods of research, general principles, and functional relationships in physical sciences and engineering. The world’s leading experts in the fields of physics and engineering will be assigned by one or several renowned editors to write the chapters comprising each volume. The content is selected by these experts from Springer sources (books, journals, online content) and other systematic and approved recent publications of physical and technical information. The volumes are designed to be useful as readable desk reference books to give a fast and comprehensive overview and easy retrieval of essential reliable key information, including tables, graphs, and bibliographies. References to extensive sources are provided.

Springer

Handbook of Electronic and Photonic Materials Safa Kasap, Peter Capper (Eds.) With CD-ROM, 930 Figures and 168 Tables

123

Editors: Safa Kasap University of Saskatchewan Department of Electrical Engineering Saskatoon, SK, S7N 5A9 Canada Peter Capper SELEX Sensors and Airborne Systems Infrared Ltd. Millbrook Industrial Estate Southampton, Hampshire SO15 0EG United Kingdom Assistant Editor: Cyril Koughia University of Saskatchewan Canada

Library of Congress Control Number:

ISBN-10: 0-387-26059-5 ISBN-13: 978-0-387-26059-4

2006921596

e-ISBN: 0-387-29185-7 Printed on acid free paper

c 2006, Springer Science+Business Media, Inc.  All rights reserved. This work may not be translated or copied in whole or in part without the written permission of the publisher (Springer Science+ Business Media, Inc., 233 Spring Street, New York, NY 10013, USA), except for brief excerpts in connection with reviews or scholarly analysis. Use in connection with any form of information storage and retrieval, electronic adaptation, computer software, or by similar or dissimilar methodology now known or hereafter developed is forbidden. The use in this publication of trade names, trademarks, service marks, and similar terms, even if they are not identified as such, is not to be taken as an expression of opinion as to whether or not they are subject to proprietary rights. The use of designations, trademarks, etc. in this publication does not imply, even in the absence of a specific statement, that such names are exempt from the relevant protective laws and regulations and therefore free for general use. Product liability: The publisher cannot guarantee the accuracy of any information about dosage and application contained in this book. In every individual case the user must check such information by consulting the relevant literature. Production and typesetting: LE-TeX GbR, Leipzig Handbook coordinator: Dr. W. Skolaut, Heidelberg Typography, layout and illustrations: schreiberVIS, Seeheim & Hippmann GbR, Schwarzenbruck Cover design: eStudio Calamar Steinen, Barcelona Cover production: WMXDesign GmbH, Heidelberg Printing and binding: Stürtz GmbH, Würzburg SPIN 11051855 9065/3141/YL 5 4 3 2 1 0

V

Foreword

The Editors, Authors, and Pu