Amorphous Cu-Zr and Fe-Ti Compositionally Modulated Films Produced by Sputtering from Elemental Targets
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AMORPHOUS Cu-Zr AND Fe-Ti COMPOSITIONALLY MODULATED FILMS PRODUCED BY SPUTTERING FROM ELEMENTAL TARGETS E. CHASON, H. KONDO AND T. MIZOGUCHI Japan Research and Development Corporation, Gakushuin University Division, 1-5-1, Mejiro, Toshimaku, Tokyo 171, Japan R.C. CAMMARATA,* AND F. SPAEPEN Division of Applied Sciences, Harvard University, Cambridge, MA02138, U.S.A. B. WINDOW, J.B. DUNLOP AND R.K. DAY CSIRO National Measurement Lab., Division of Applied Physics, P.O. Box 218, Lindfield, NSW 2070, Australia ABSTRACT Amorphous compositionally modulated films of Cu-Zr and Fe-Ti have been prepared by sequential sputter deposition of the elemental metals. For Cu-Zr, a critical modulation amplitude has been found, below which the samples are entirely amorphous. The effective interdiffusion coefficient during deposition has been estimated, and found to be assisted by the free energy of mixing and the ion bombardment. X-ray studies of the modulation peaks, using grid scans, reveal a sharp mosaic, and asymmetrical peaks in some samples. INTRODUCTION The first amorphous metallic compositionally modulated films were produced by Rosenblum et al. [1] for the purpose of studying interdiffusion upon subsequent annealing. Using d.c. sputtering on a movable substrate from two alloy targets, they prepared (Pd8 5 Sil 5 ) 61 /(Fe 8 5 Bl )39 films with modulation wavelengths around 3 nm. Greer et al. [2] and Caimarata and Greer [3] have reported results on similar materials. Rosenblum et al. [1] also succeeded in preparing fully amorphous modulated films of composition (Au7 Pd8 oSil 3 )7 0/Fe~o, with a wavelength of 2.1 nm, by using elemental Fe as one of the sputtering targets. Lin et al. [4], and Lin and Spaepen [5] have reported the formation of fully amorphous modulated films of average composition Ni50 Zr50 Co40 Nb60 , and NixNblx (40
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