Characterisation of a microwave induced plasma torch for glass surface modification
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RESEARCH ARTICLE
Adam BENNETT, Nan YU, Marco CASTELLI, Guoda CHEN, Alessio BALLERI, Takuya URAYAMA, Fengzhou FANG
Characterisation of a microwave induced plasma torch for glass surface modification
© Higher Education Press 2020
Abstract Microwave induced plasma torches find wide applications in material and chemical analysis. Investigation of a coaxial electrode microwave induced plasma (CE–MIP) torch is conducted in this study, making it available for glass surface modification and polishing. A dedicated nozzle is designed to inject secondary gases into the main plasma jet. This study details the adaptation of a characterisation process for CE–MIP technology. Microwave spectrum analysis is used to create a polar plot of the microwave energy being emitted from the coaxial electrode, where the microwave energy couples with the gas to generate the plasma jet. Optical emission spectroscopy analysis is also employed to create spatial maps of the photonic intensity distribution within the plasma jet when different additional gases are injected into it. The CE–MIP torch is experimentally tested for surface energy modification on glass where it creates a super-hydrophilic surface. Received May 7, 2020; accepted August 3, 2020 Adam BENNETT Surface Engineering and Precision Institute, Cranfield University, Cranfield MK43 0AL, UK
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Nan YU ( ), Fengzhou FANG ( ) Centre for Micro/Nano Manufacturing Technology (MNMT-Dublin), University College Dublin, Dublin D04 V1W8, Ireland E-mails: [email protected]; [email protected] Marco CASTELLI Manufacturing Technology Centre (MTC), Coventry CV7 9JU, UK Guoda CHEN Key Laboratory of E&M, Ministry of Education & Zhejiang Province, Zhejiang University of Technology, Hangzhou 310014, China Alessio BALLERI Centre for Electronic Warfare, Information and Cyber, Cranfield University, Shrivenham SN6 8LA, UK Takuya URAYAMA Adtec Plasma Technology Co., Ltd., Fukuyama, Hiroshima 712-0942, Japan
Keywords microwave induced plasma, spectrum analysis, surface modification
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Introduction
Ultra-smooth surface processing can be realized by utilising mechanical [1], electrochemical mechanical [2], dry chemical process [3], or by energy beam [4] technology. Previous plasma figuring of silicon based optical surfaces has been undertaken using a radio frequency plasma jet at atmospheric pressure. Inductively coupled plasma technology was demonstrated on large optical surfaces made of ultra-low expansion glass and fused silica using reactive plasma jets [5]. Capacitively coupled microwave plasma and capacitively coupled plasma technologies have also demonstrated form correction of optical surfaces [6,7]. In other plasma chemistry applications microwave induced plasma (MIP) has become the principal microwave plasma technology [8]. MIP generates plasma through the inductive transfer of energy from standing waves within a resonator, where a dielectric tube is located. The design typically employed for discharging atmospheric pressure plasma jets involves the use of a coaxial electrode to launch the microwaves i
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