Characterization of Mo/Si Multilayer Structures by High-Resolution Electron Microscopy
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CHARACTERIZATION OF Mo/Si MULTILAYER STRUCTURES BY HIGH-RESOLUTION ELECTRON MICROSCOPY CHUNG-HEE CHANG, MARY BETH STEARNS AND DAVID J. SMITH* Department of Physics, Arizona State University, Tempe, * Also at Center for Solid State Science
AZ 85287
ABSTRACT A series of Mo/Si multilayer films (MLF) has been fabricated by e-beam evaporation onto (100) silicon substrates at substrate temperatures (T ) in the range of 300 to 600K, with deposition The quality of the samples rates varying from 0.5 to 3A/s. fabricated at 525K
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