Correction to: Laser Induced Dielectric Breakdown for Chemical Vapor Deposition by Hydrogen Reduction of Volatile Boron

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Correction to: Laser Induced Dielectric Breakdown for Chemical Vapor Deposition by Hydrogen Reduction of Volatile Boron Halides ­BCl3 and ­BF3 I. B. Gornushkin1 · P. G. Sennikov2 · R. A. Kornev2 · A. A. Ermakov2 · V. E. Shkrunin2

© Springer Science+Business Media, LLC, part of Springer Nature 2020

Correction to: Plasma Chemistry and Plasma Processing https​://doi.org/10.1007/s1109​0-020-10096​-w The original version of this article unfortunately contained a mistake in the abstract section and figure 7. The corrections are listed below.

The original article can be found online at https​://doi.org/10.1007/s1109​0-020-10096​-w. * I. B. Gornushkin [email protected] 1

BAM Federal Institute for Materials Research and Testing, Richard‑Willstätter‑Strasse 11, 12489 Berlin, Germany

2

G.G. Devyatykh Institute of Chemistry of High-Purity Substances of RAS, 49 Tropinin Str., Nizhny Novgorod, Russia 603951



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Plasma Chemistry and Plasma Processing

(a) In the Abstract section: 4th line “BCl3” is repeated twice. It should read as “A break­ F3 with hydrogen, argon, and methane are studied both down in mixtures of ­BCl3 and B theoretically and experimentally.” (b) Figure 7 is incorrect. The correct Fig. 7 is given below.

(a)

(d)

(b)

(e)

(c)

(f)

Fig. 7  MS spectra of a ­BCl3; b ­BCl3 + H2; c ­BCl3 + H2 + CH4; d ­BF3; e ­BF3 + H2; and f ­BF3 + H2 + CH4. The black and red correspond to spectra taken before and after laser irradiation, correspondingly Publisher’s Note  Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.

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