Electron Spin Resonance Investigations of Rapid Thermal Oxidized Porous Silicon

  • PDF / 317,860 Bytes
  • 6 Pages / 420.48 x 639 pts Page_size
  • 95 Downloads / 243 Views

DOWNLOAD

REPORT


ELECTRON SPIN RESONANCE

INVESTIGATIONS OF RAPID THERMAL

OXIDIZED POROUS SILICON H. LINKE 1, P. OMLING 1, B.K. MEYER2 , V. PETROVA-KOCH2 , T. MUSCHIK2 V. LEHMANN' 1) Solid State Physics Department, University of Lund, S-22100 Lund, Sweden 2) Physics Department, Tech. Univ Munich, D 8046 Garching, Germany 3) Siemens Research Laboratories,D 8000 Munich, Germany ABSTRACT We studied the defect properties present in rapid thermal oxidized porous silicon (RTOPS) by Electron Spin Resonance (ESR). Two different types of defects are distinguished, one similar to the ones observed in damaged c-Si, and in a-Si.The second one is probably related to the Pbocenter at the Si/SiO2 interface. The minimum dens-lty of 10 6 cm- 3 is observed for the as etched and for the 900 C oxidized samples, but reaches a maximum of 8x018 cm-3 for the 600 C samples. The PL intensity anticorrelates with the defect densities, which shows that nonradiative recombination via defects is a very powerful channel in quenching the PL efficiency.

1.

INTRODUCTION With the discovery of the efficient visible photoluminescence

(PL) at room temperature (RT) /1/, porous silicon (PS) became an optoelectronics. Unfortunately (VIS) light illumination /2/, electron beam /4/ 3

orders

etc.

ultraviolet (UV) and visible heating /3/, exposure to an

cause a pronounced PL degradation

of magnitude).

The main reason for this

the very low structural stability bond

strength

only

the electrolytically etched interesting material for

/5/)

of the hydrides SiHx

covering

the

internal

(up to

behaviour

is

(ca.3 eV

surface

of

the

as-prepared material /3/. The understanding of the PL degradation goes hand in hand with the understanding of the origin of light in the PS. The latter is controversially discussed recovery

in

the

when

high

internal surface spectra of thick emission

is

not

literature.

The

quality

thermal

recent

observation

oxide

is

formed

of on

PL the

/11,12/ (no traces of SiHx bonds in the IR samples /16/) brings evidence that the light related

to

surface

luminous

agents

Mat. Res. Soc. Symp. Proc. Vol. 283. @1993 Materials Research Society

(hydrides

252

SiHx /6/ or siloxene Si6H6-m 0 3+n/7/) (crystallites). Independent of the

but to the Si remnants different mechanisms of

radiative recombination which can take place in the remnants (band to band recombinations /1/, or recombination via surface confined states /19/) the PL gain will be affected by the density of electronic defects acting as nonradiative recombination centers (the nonradiative recombination process is faster than the radiative ones, in the considered PS and RTOPS the decay is slow (ps) /14/). Electron Paramagnetic Resonance (EPR) investigations can provide valuable information about the nature, microscopic neighbourhood and density of these defects. So far only a few publications dealing with spin dependent properties of PS are known /2,8-11,13/. They were dealing with samples with hydride and oxyhydride coverage. Here we present an EPR study of rapid therm