Erratum to: Toward multiscale modeling of thin-film growth processes using SLKMC
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i: 10.1557/jmr.2018.44, Published by Materials Research Society with Cambridge University Press, 28 March 2018. The paper by Acharya and Rahman1 was inadvertently published in Volume 33, Issue 6 of Journal of Materials Research. The article is part of the Journal of Materials Research Focus Issue on Advanced Atomistic Algorithms in Materials Science and is referenced as such in the introduction to that issue.2 The publishers apologize for the error.
REFERENCES 1. S.R. Archarya and T.S. Rahman: Toward multiscale modeling of thin-film growth processes using SLKMC. J. Mater. Res. 33, 709–719 (2018). doi: 10.1557/jmr.2018.44. 2. E. Martinez, D. Perz, V. Gavani, and S. Kenny: Introduction. J. Mater. Res. 33, 773–776 (2018). doi: 10.1557/jmr.2018.69.
DOI: 10.1557/jmr.2018.68 Downloaded University Western on2018 29 Apr 2018Ó at 01:00:13, subject to the Cambridge 872 from https://www.cambridge.org/core. J. Mater. Res., Vol. of 33, No. 7,Ontario, Apr 13, Materials Research Society Core 2018terms of use, available at https://www.cambridge.org/core/terms. https://doi.org/10.1557/jmr.2018.68
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