Fabrication of CdS Thin Films Using Continuous Wave Laser Evaporation
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FABRICATION OF CdS THIN FILMS USING CONTINUOUS WAVE LASER EVAPORATION E.W. Tenpas, K.D. Vuong, S. Orloff, J.G Fagan, V. Wu, and X.W. Wang Alfred University, Department of Electrical Engineering, Alfred New York 14802 ABSTRACT We report new results on continuous wave Nd:YAG laser deposition of Cadmium Sulfide (CdS) thin films. Substrates were soda-lime silicate (SLS) glass, silica glass, silicon, alumina, and copper coated formvar sheets. As-deposited films were characteristically mixtures of cubic and hexagonal phases. X-ray diffraction analysis reveals that two different grain size groups are present. As revealed by SEM micrographs, films had smooth surface morphology. Transmission electron microscopy analysis reveals that grain sizes were extremely small. Also, semiconductive behavior was noted._ INTRODUCTION Cadmium Sulfide (CdS) thin films have useful semiconductive, piezoelectric and optoelectric properties. Several different methods have been used to deposit CdS films, including sputtering and laser evaporation techniques. The laser systems utilized include: pulsed Nd YAG lasers, pulsed ruby, pulsed C02 , pulsed excimer, and continuous wave (CW) argon lasers'. In the case of CdS thin films, it is advantageous to use a continuous wave laser
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