Fast deposition of thick diamond-like carbon films by ion-beam technique
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Fast deposition of thick diamond-like carbon films by ion-beam technique Bin Liao1,2 • Jingjing Yu1,2 • Yudong Wang1,2 • Baoan Bian3 • Qili Jiang1,2 Jun Luo1,2 • Xu Zhang1,2 • Xianying Wu1,2 • Minju Ying1,2
•
Received: 2 September 2016 / Accepted: 19 July 2017 Ó Springer-Verlag GmbH Germany 2017
Abstract A diamond-like carbon film doped with TiC nanocrystallites (TiC–DLC) with a thickness of 35.8 lm was successfully prepared on a stainless steel substrate by employing a combination of metal vapor vacuum arc and filtered cathode vacuum arc techniques. A maximum deposition rate of 0.25 lm/min was achieved for TiC–DLC films. The structure and properties of the TiC–DLC films were systematically analyzed using different methods such as transmission electron microscopy, X-ray photoelectron spectroscopy, Raman spectroscopy, scanning electron microscopy, X-ray diffraction, and friction and wear tests. The results indicated that typical a-C:H films containing nano-sized TiC grains were deposited which exhibit improved mechanical properties such as high cohesive strength, Vickers hardness, and capacity against high temperature. Parameter windows for C2H2 flow rate and solenoid current were also provided for the deposition of TiC–DLC films to meet the requirements for using the material for specific commercial applications.
1 Introduction Diamond-like carbon films (DLC) have excellent properties such as low friction coefficient, high hardness, optical transparency, chemical inertness and high electrical resistivity [1–5]. Thus, DLC films have great potential & Bin Liao [email protected] 1
College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China
2
Beijing Radiation Center, Beijing 100088, China
3
Jiangnan University, Jiangshu, China
applications in a wide range of industrial areas such as wear-resistant coatings [6, 7], protective optical coatings [8], and so on [9, 10]. It is well established that DLC films show poor adhesion on metallic substrates. Delamination are the most common failure mechanism of such a film due to its high compressive stress prepared by different deposition methods, such as pulsed laser deposition [11, 12], magnetron sputtering [13], filtered vacuum vapor arc [14], plasma enhanced chemical vapor deposition [15]. Several approaches such as the incorporation of metal/nonmetal elements, thermal annealing, and multilayer deposition methods have been employed in order to minimize the residual stress and improve the adhesion of DLC films. Properties of DLC can be modified by incorporating elements (such as Ti, Si, Ca, P, F) in the films prepared by magnetron sputtering, multi-arc ion plating, etc. [7, 11–13, 15]. However, the thickness of the DLC films reported in those studies is less than 10 lm. Only a few reports focused on the deposition of highly thick DLC films as well as on the deposition rate of DLC films. It has not yet been explored if DLC films exhibiting both high thickness and excellent wear resistances could be obtained by varying the deposition para
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