Fourth Ion-Beam Conference
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Order shall be followed. (Article X - Sections) (1. A section may be established to provide local forums for the interaction of scientists and engineers in various materials disciplines, and to promote the exchange and dissemination of information from the society. Establishment of a section, with a title depicting the region with which it is associated, will be authorized by the council.) (Article XI - Student Chapters) (1. Student Chapters may be established to foster discussion among students and faculty in the various materials disciplines, to generate student interest in materials science, and to promote the exchange and dissemination of information from the Society. A Chapter, with a title containing the name of the college or university with which it is associated, will be authorized by the Council.)
FOURTH ION-BEAM CONFERENCE The Fourth International Conference on Ion Beam Modification of Materials was held at Cornell July 16-20, and was attended by some 380 participants from the United States, Europe, Asia, and Australia. Topics ranged from ion implantation in metals and semiconductors to reactive ion etching and formation of fine line structures with ion beams. Organizer of the meeting (and recipient of the MRS's Von Hippel Award), Professor J.W. Mayer of Cornell, reports: Ion Beam Interaction "The emphasis of the conference was on physical processes and the materials science aspects of the interaction of ion beams with solids. In addition, there were oral presentations and posters on the applications of implantation to metallurgical problems of wear and corrosion, as well as to semiconductor structures. "The conference opened with an analysis of New York State wines in the Johnson Art Museum overlooking Cayuga Lake and closed with the banquet address by Millie Dresselhaus on 'Education, Technology, and International Programs.' There were laboratory tours of the National Submicron Facility, the Cornell High Energy Synchrotron Source (CHESS), and the Rutherford Backscattering Facility." The Conference Series The conference series started in 1970 as "Ion Implantation in Semiconductors," chaired by Fred Eisen, and evolved to "Ion Beam Modification of Materials" in 1978, chaired by Jozsef Gyulai, in order to reflect the increased interest in the use of ion beams in the processing of metals, polymers, and ceramics.
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