Large magnetic permeability and resonant frequency of CoFe nanofilms electrodeposited via optimizing plating solution pa
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Large magnetic permeability and resonant frequency of CoFe nanofilms electrodeposited via optimizing plating solution parameters based on electrochemistry mechanisms BaoYu Zong*1, YuPing Wu1, Nguyen Nguyen Phuoc1, Pin Ho2, FuSheng Ma1 1 Temasek Laboratories, National University of Singapore, 5A Engineering Drive 1, Singapore 117411. [email protected]. 2 Department of Materials Science and Engineering, National University of Singapore, Singapore 117576. ABSTRACT A simple methodology to electrodeposit thin soft CoFe films with desirable microwave properties from simple salt solutions at room temperature is demonstrated. Plating solution parameters have diverse influences on real potentials of ion reductions and deposition behavior of the FeCo crystals, consequently affecting largely the particle size, crystal structure and chemical composition of the film fabricated. This in turn determines their static magnetism and dynamic microwave properties. Through optimizing solution additive, concentration and temperature from electrodeposition mechanism, the as-prepared nanofilms possess a low coercivity of < 30 Oe, moderate anisotropy of 60-90 Oe, high crystallinity and magnetic moment of ≥ 2.0 T, and hence readily display an ultrahigh magnetic permeability (up to 1128) and resonant frequency (up to 2.1 gigahertz) simultaneously, as well as other desirable physicochemical properties. Thus the nanofilms can be applied to high gigahertz frequency applications. INTRODUCTION Thin magnetic soft films with desirable microwave properties (e.g., large complex permeability (μ) and high resonant frequency (fr)) can be applied to various high gigahertz (GHz) microwave applications [1,2]. Electrodeposition is a simple tool to prepare these thin films quickly and cost-effectively [2,3]. However during film electrodeposition, numerous plating parameters can affect the microwave properties [3], it remains a challenge to achieve a thin film with large μ (e.g., ≥ 1000) and fr (e.g., ≥ 1 GHz) simultaneously. Even though intensive studies have focused on achieving the desirable microwave properties via electrodeposition [3-5], the prepared films are either low in μ (
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