Microstructure and Magnetron Sputtering Properties of Molybdenum Target Prepared by Low-Pressure Plasma Spraying
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Microstructure and Magnetron Sputtering Properties of Molybdenum Target Prepared by Low-Pressure Plasma Spraying Yueming Wang1,2 • Qiuhao Tang2 • Deqiang Chen3 • Xiubo Liu4 • Xiang Xiong5
Submitted: 5 August 2019 / in revised form: 6 November 2019 Ó ASM International 2019
Abstract Planar molybdenum targets were fabricated by low-pressure plasma spraying (LPPS) under 2.6 9 104 Pa pressure. A lamellar structure consisting of vertical columnar grains and compact interlamellar contacts was found in the LPPS deposits. The oxygen content by mass, porosity, average grain size, microhardness, and ultimate tensile strength of the LPPS target were about 0.18%, 1.1%, 0.4 lm, 361.8 HV0.025, and 373.2 MPa, respectively. Electron backscattered diffraction (EBSD) analysis of the LPPS sample showed proportions of \001[-, \011[-, and \111[-oriented grains of about 12.0%, 16.9%, and 9.2% of the total, respectively. The molybdenum target exhibited excellent magnetron sputtering performance, since most of the grains with size less than 1.0 lm were irregularly distributed without preferred orientation. Rapid sputtering and uniform thinning on the
& Yueming Wang [email protected]; [email protected] 1
Hunan Provincial Key Laboratory of High Efficiency and Precision Machining of Difficult-to-Cut Material, Hunan University of Science and Technology, Xiangtan 411201, China
2
Hunan Provincial Key Defense Laboratory of High Temperature Wear-resisting Materials and Preparation Technology, Hunan University of Science and Technology, Xiangtan 411201, China
3
National United Engineering Laboratory for Advanced Bearing Tribology, Henan University of Science and Technology, Luoyang 471000, China
4
Hunan Province Key Laboratory of Materials Surface & Interface Science and Technology, Central South University of Forestry and Technology, Changsha 410004, China
5
State Key Laboratory of Powder Metallurgy, Central South University, Changsha 410083, China
surface of LPPS molybdenum targets took place during magnetron sputtering. Smooth and continuous molybdenum thin film with thickness of about 700 nm could be deposited by magnetron sputtering from the LPPS samples. The x-ray diffraction (XRD) spectra of molybdenum thin film with body-centered cubic structure showed that the intensity of (110) diffraction peak was much higher than that of (220) one. Keywords grain orientation low-pressure plasma spray magnetron sputtering mechanical properties molybdenum target thin film
Introduction Molybdenum (Mo) is a special material with high melting point, excellent conductivity, low specific impedance, good corrosion resistance and environmental protection performance, etc. As a result, molybdenum is the best choice for microelectronics applications. The demand for large-area coating has increased dramatically owing to the rapid development of flat-panel displays, electrodes and wiring materials for thin-film solar cells, and barrier materials for semiconductors (Ref 1, 2). Sputtering targets must thus be developed in several direct
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