New, Germanium - Related Defect in Neutron - Irradiated Gallium Phosphide

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NEW , GERMANIUM - RELATED DEFECT IN NEUTRON - IRRADIATED GALLIUM PHOSPHIDE

J. BARCZYNSKA AND E. Institute

of

Warszawa,

GOLDYS

Experimental

Physics,

Warsaw

University,

Hoza

69,

00-681

Poland

ABSTRACT

GaP crystals 1019

neutrons

resulted 10%

in

of

n

were cm .

The

type

-

observed

discussed.

in

with thermal

isochronal

conductivity

transmuted

absorption spectrum is

irradiated

2

/

Ge

atoms

annealing

of

band

photoconductivity.

at

with a

samples.

neutral

donors.

centered

The

of

up

After

1.4

to

8000C

The similar

the

absorption

*

8000C anneal

Simultaneously

at 1 eV.

origin

fluence

temperatures

irradiated

become

shows a broad

neutrons

the

feature band

is

The band is most likely due to germanium - related defect.

Introduction

Thermal

neutron irradiation

n-type silicon. When

a

The method

semiconductor

lattice

nuclei

into

the

e. g.

Si

nuclei

in

the

atoms into

crystalline

irradiation

is

the of

atoms

move

annealing to

is

a standard

method to produce

irradiated

neutrons.

The

occupying P).

of

with

neutrons

nuclei

nearby

small

undergo

position

of transmutation.

a

the

fraction

in

the

periodic

The

transmuted

nuclei

are

not

in

An

additional

effect

accompanying

structural

defects

various

due

to

and the

optical

properties

removal

of

final,

often

their

of

structure

the

defects

table

substitutional

the

neutron processes

semiconductor. place,

positions

(

substitutional

recoil

takes

of

transformation

defects lower the Fermi level into the midgap region

electrical

course

is

lattice.

formation

The introduced alter

of

transmutes

position

crystal

capture

and annealing

takes advantage of the phenomenon

and

thus

In

the

transmuted and

become

electrically active. Thermal its n-

to IV group the case

neutron

or p-type

irradiation

conductivity,

amphoteric

dopants.

cation or anion sublattice of

GaAs

[1]

and

of

III-V

because After

when it

InSb

[2]

semiconductor

the atoms annealing

the

in

principle

group

moves

or an acceptor.

transmutation

doping

to

transmute

IV group dopant

acts as a donor neutron

leads

from the III

to

In

the

leads

to

predominant donor introduction. We

have

studied

the

thermal

neutron

irradiated

processes for Ga and and P atoms follow the reactions:

Mat. Res. Soc. Symp. Proc. Vol. 163. @1990 Materials Research Society

GaP.

The

transmutation

180

69Ga (n, T) = 7°Ga(g-) • 7°Ge (21 min) 0t

= 1.68 + 0.07 b

th

7 Ga (n,

) =7 Ga(R-) 4 72Ge (14 h)

(r = 4.86 + 0.0.25 b th 31p(n) 32p(f3-) 32S(14.3 d) o-th = 180 + 7 mb. The comparison introduced atoms

of

the transmutation

into GaP

in

thermal

is

Ge.

cross sections

Former

neutron

papers

irradiated

[3]

GaP

shows

indicate

act

as

that the that

all

substitutional

main dopant

transmuted

Ge

donors

Ga

on

site. We report on more complicated behaviour of transmuted Ge in GaP.

Experiment

As

samples

orientation neutral

we

grown

donor

used

by

LEC