New, Germanium - Related Defect in Neutron - Irradiated Gallium Phosphide
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		    NEW , GERMANIUM - RELATED DEFECT IN NEUTRON - IRRADIATED GALLIUM PHOSPHIDE
 
 J. BARCZYNSKA AND E. Institute
 
 of
 
 Warszawa,
 
 GOLDYS
 
 Experimental
 
 Physics,
 
 Warsaw
 
 University,
 
 Hoza
 
 69,
 
 00-681
 
 Poland
 
 ABSTRACT
 
 GaP crystals 1019
 
 neutrons
 
 resulted 10%
 
 in
 
 of
 
 n
 
 were cm .
 
 The
 
 type
 
 -
 
 observed
 
 discussed.
 
 in
 
 with thermal
 
 isochronal
 
 conductivity
 
 transmuted
 
 absorption spectrum is
 
 irradiated
 
 2
 
 /
 
 Ge
 
 atoms
 
 annealing
 
 of
 
 band
 
 photoconductivity.
 
 at
 
 with a
 
 samples.
 
 neutral
 
 donors.
 
 centered
 
 The
 
 of
 
 up
 
 After
 
 1.4
 
 to
 
 8000C
 
 The similar
 
 the
 
 absorption
 
 *
 
 8000C anneal
 
 Simultaneously
 
 at 1 eV.
 
 origin
 
 fluence
 
 temperatures
 
 irradiated
 
 become
 
 shows a broad
 
 neutrons
 
 the
 
 feature band
 
 is
 
 The band is most likely due to germanium - related defect.
 
 Introduction
 
 Thermal
 
 neutron irradiation
 
 n-type silicon. When
 
 a
 
 The method
 
 semiconductor
 
 lattice
 
 nuclei
 
 into
 
 the
 
 e. g.
 
 Si
 
 nuclei
 
 in
 
 the
 
 atoms into
 
 crystalline
 
 irradiation
 
 is
 
 the of
 
 atoms
 
 move
 
 annealing to
 
 is
 
 a standard
 
 method to produce
 
 irradiated
 
 neutrons.
 
 The
 
 occupying P).
 
 of
 
 with
 
 neutrons
 
 nuclei
 
 nearby
 
 small
 
 undergo
 
 position
 
 of transmutation.
 
 a
 
 the
 
 fraction
 
 in
 
 the
 
 periodic
 
 The
 
 transmuted
 
 nuclei
 
 are
 
 not
 
 in
 
 An
 
 additional
 
 effect
 
 accompanying
 
 structural
 
 defects
 
 various
 
 due
 
 to
 
 and the
 
 optical
 
 properties
 
 removal
 
 of
 
 final,
 
 often
 
 their
 
 of
 
 structure
 
 the
 
 defects
 
 table
 
 substitutional
 
 the
 
 neutron processes
 
 semiconductor. place,
 
 positions
 
 (
 
 substitutional
 
 recoil
 
 takes
 
 of
 
 transformation
 
 defects lower the Fermi level into the midgap region
 
 electrical
 
 course
 
 is
 
 lattice.
 
 formation
 
 The introduced alter
 
 of
 
 transmutes
 
 position
 
 crystal
 
 capture
 
 and annealing
 
 takes advantage of the phenomenon
 
 and
 
 thus
 
 In
 
 the
 
 transmuted and
 
 become
 
 electrically active. Thermal its n-
 
 to IV group the case
 
 neutron
 
 or p-type
 
 irradiation
 
 conductivity,
 
 amphoteric
 
 dopants.
 
 cation or anion sublattice of
 
 GaAs
 
 [1]
 
 and
 
 of
 
 III-V
 
 because After
 
 when it
 
 InSb
 
 [2]
 
 semiconductor
 
 the atoms annealing
 
 the
 
 in
 
 principle
 
 group
 
 moves
 
 or an acceptor.
 
 transmutation
 
 doping
 
 to
 
 transmute
 
 IV group dopant
 
 acts as a donor neutron
 
 leads
 
 from the III
 
 to
 
 In
 
 the
 
 leads
 
 to
 
 predominant donor introduction. We
 
 have
 
 studied
 
 the
 
 thermal
 
 neutron
 
 irradiated
 
 processes for Ga and and P atoms follow the reactions:
 
 Mat. Res. Soc. Symp. Proc. Vol. 163. @1990 Materials Research Society
 
 GaP.
 
 The
 
 transmutation
 
 180
 
 69Ga (n, T) = 7°Ga(g-) • 7°Ge (21 min) 0t
 
 = 1.68 + 0.07 b
 
 th
 
 7 Ga (n,
 
 ) =7 Ga(R-) 4 72Ge (14 h)
 
 (r = 4.86 + 0.0.25 b th 31p(n) 32p(f3-) 32S(14.3 d) o-th = 180 + 7 mb. The comparison introduced atoms
 
 of
 
 the transmutation
 
 into GaP
 
 in
 
 thermal
 
 is
 
 Ge.
 
 cross sections
 
 Former
 
 neutron
 
 papers
 
 irradiated
 
 [3]
 
 GaP
 
 shows
 
 indicate
 
 act
 
 as
 
 that the that
 
 all
 
 substitutional
 
 main dopant
 
 transmuted
 
 Ge
 
 donors
 
 Ga
 
 on
 
 site. We report on more complicated behaviour of transmuted Ge in GaP.
 
 Experiment
 
 As
 
 samples
 
 orientation neutral
 
 we
 
 grown
 
 donor
 
 used
 
 by
 
 LEC		
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