Patterning of Single-Walled Carbon Nanotubes Using Wet Chemical Self-Assembling and Photolithography Techniques
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Patterning of Single-Walled Carbon Nanotubes Using Wet Chemical Self-Assembling and Photolithography Techniques Myung-Sup Jung1,2 , Sung-Ouk Jung1, Hee-Tae Jung2,*, Do Yun Kim1, Seok Kwang Doo1 1 Materials Center, Samsung Advanced Institute of Technology, P.O. Box 111, Suwon 440-600, Korea 2 Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science & Technology, 373-1 Guseong-dong, Yuseong-gu, Daejeon 305-701, Korea ABSTRACT Single-walled carbon nanotubes (SWNTs) have been chemically attached with high density onto a patterned substrate. To form the SWNT pattern, the substrate was treated with acid-labile group protected amine, and an amine prepattern was formed using a photolithographic process with a polymeric photo acid generator. The SWNT monolayer pattern was then formed through the amidation reaction between the carboxylic acid groups of carboxylated SWNTs (ca-SWNTs) and the prepatterned amino groups. A high-density multilayer was fabricated via further repeated reaction between the carboxylic acid groups of the ca-SWNTs and the amino groups of the linker with the aid of a condensation agent. Scanning electron microscopy results show that the patterned SWNT films have uniform coverage with high surface density. INTRODUCTION Carbon nanotubes (CNTs) have attracted much attention in recent years because of their remarkable physical and chemical properties. Their potential applications include flat panel displays, logic gates, sensors, and energy storage, which all require that the CNTs be patterned at defined positions with large-scale control of location and orientation [1-3]. Many efforts have been made to pattern CNTs on a large scale. According to previous reports, CNT patterns on substrates have been fabricated with various selective growth and self-assembly methods. To prepare for the selective growth of CNTs, various technologies such as plasma patterning [3] as well as soft-lithographic [4] and photolithographic methods [2,5] have been applied to the prepatterning of metal catalysts. By growing multiwalled carbon nanotubes (MWNTs) on these prepatterned metal catalysts, well-defined MWNT patterns have been produced with high resolution and density. However, the growth method is difficult to apply for SWNT patterning and always requires the use of high processing temperatures. As a result, the application of this method has been limited. Self-assembly methods have also been applied to the patterning of SWNTs, and have proved to be especially powerful for patterning at low temperatures. Several
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self-assembly methods, including adsorption onto prepatterned substrates [6-9] as well as chemical assembly onto various surfaces [10,11], have been used to pattern SWNT films. Although this method has great potential for the modification and functionalization of surfaces, the adhesion between the resulting SWNT patterns and substrates is not sufficient for practical applications, which results in low surface density. In this paper we rep
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