Plasma Deposition of Tungsten
- PDF / 342,401 Bytes
- 6 Pages / 420.48 x 639 pts Page_size
- 31 Downloads / 218 Views
PLASMA DEPOSITION OF TUNGSTEN K. E. Greenberg Sandia National Laboratories,
Albuquerque,
NM 87185.
ABSTRACT Tungsten films were plasma-deposited using an abnormal glow discharge The films through a mixture of tungsten hexafluoride, hydrogen, and argon. adhered well to silicon, silicon dioxide, gallium arsenide, and aluminum Typical deposition substrates placed directly on the discharge cathode. rates were on the order of 160 Angstroms/minute with as-deposited film was analysed using a The tungsten microohm-cm. resistivities of 40 to 70 number of techniques including X-ray diffraction, scanning electron Low-resistivity (
Data Loading...
