Preparation of Line Patterned Mesoporous DAM-1 Thin Films via Pulsed Laser Deposition
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Preparation of Line Patterned Mesoporous DAM-1 Thin Films via Pulsed Laser Deposition Decio Coutinho and Kenneth J. Balkus, Jr. University of Texas at Dallas, Department of Chemistry and the UTD NanoTech Institute, Richardson, TX 75083-0688 Abstract: Patterned mesoporous DAM-1 thin films were prepared on flexible transparent film utilizing the pulsed laser deposition and a line patterning technique. The patterned lines are transferred to the transparent film using a laser printer or copy machine. Laser ablation of DAM1 onto the patterned substrate followed by a hydrothermal treatment resulted in a densely packed mesoporous film. Upon removal of the patterned lines (i.e. the underlying toner) by ultrasonic treatment in toluene, patterned DAM-1 films were produced. INTRODUCTION Patterned mesoporous silica thin films are attracting interest as potential applications emerge. For example, Wirnsberger et al. employed mesoporous silica to create mirrorless lasing from mesostructured waveguides [1]. Several strategies have been reported for the preparation of patterned mesoporous silica films that range from stamping to inkjet printing [1-9]. For example, one approach that has been successfully employed involves heating a patterned, micromolded precursor gel to form patterned SBA-15 and SBA-16 [4]. These patterns were obtained by placing a poly(dimethylsiloxane) (PDMS) stamp in contact with the substrate surface containing the precursor gel. Recently, Brinker and co-workers reported the combination of surfactant self-assembly with pen lithography, ink-jet printing, and dip coating of patterned monolayers to form functional materials in a rapid prototyping process [8]. Another approach involves micropatterned, oriented zeolite monolayers covalently bound to glass substrates [9]. This method involves using PDMS stamp to pattern the glass substrate with inert octadecyl groups followed by the anchoring of 3-chloropropyl groups on the regions of the substrate not covered with the inert octadecyl groups. Zeolite crystals are then attached to the patterned glass substrate producing zeolite monolayers only on the regions covered with the chloropropyl groups [9]. We have found that patterned MCM-41 films could be obtained by laser ablation through a mask [10]. Pulsed laser deposition (PLD) involves the deposition of a tightly packed layer of molecular sieve fragments onto a substrate [11-13]. The laser deposited film is then reorganized via a hydrothermal treatment to form a crystalline film. Often the resulting membranes are oriented such as with UTD-1, MCM-22, and MCM-41 [11-13]. A novel approach to pattern DAM-1 mesoporous silica films by the PLD method, which involves a line patterning technique, has been developed. Recently, a method of patterning conducting polymers referred to as line patterning was reported by MacDiarmid and co-workers [14]. In this case, line patterning involves creating an image by a laser or copy machine followed by coating with a polymer. Subsequent sonication of the film removes the underlying toner ass
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