Ra16.36/Rb16.36 Nanofluidic capillaries produced via femtosecond laser induced delamination of thin thermal oxide films
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0901-Ra16-36-Rb16-36.1
MRS Fall 2005 Proceedings Entry Ra16.36/Rb16.36 Nanofluidic capillaries produced via femtosecond laser induced delamination of thin thermal oxide films from Si(100) substrates. Authors: Joel P. McDonald1,4, Vanita R. Mistry2, Katherine E. Ray2, Steven M. Yalisove3,4 1
Applied Physics Program, University of Michigan, 2477 Randall Laboratory, Ann Arbor, MI 48109-1120 College of Engineering, University of Michigan, Lurie Engineering Center, 1221 Beal Avenue, Ann Arbor, MI 48109-2102 3 Deparment of Materials Science and Engineering, University of Michigan, 2200 Hayward Ave., Ann Arbor, MI 48109 4 Center for Ultrafast Optical Science, University of Michigan, 1006 Gerstacker Building, 2200 Bonisteel Avenue, Ann Arbor, MI 48109 2
Abstract: Highly selective and repeatable delamination of thermal oxide films from Si(100) substrates has been performed using single and multiple femtosecond laser pulses forming bubbles or blisters. By overlapping the bubbles laterally, tubes or capillaries can be formed with a range of volumes suitable for nanofluidics. By scanning the sample through the laser using an automated translation stage, patterns of tubes with arbitrary complexity can be formed, while the scan velocity can easily control the volume of the tubes. The production time for capillaries in this fashion is considerably less than with other lithographic techniques, while the proximity of the tubes to the underlying silicon substrate yields the possibility for integrated devices. The optimal laser and sample translation conditions will be presented which provide the most uniform tubes. Atomic force microscopy and optical microscopy of capillaries with a range of volumes will also be presented. Introduction: Femtosecond (fs) pulsed laser damage studies of Si(100) with and without native oxide established that the presence or absence of the native oxide can significantly influence both the damage threshold (laser pulse energy required to produce damage) and damage morphology [1]. In order to further investigate the role of thin oxide films on fs laser damage, damage studies were performed on Si(100) samples with thermally grown oxide (SiO2) films of a range of thicknesses (20 – 1200 nm) [2]. In that work, two primary damage morphologies were observed to result from irradiation with fs laser pulses. For high laser fluence [J/cm2] (greater than 0.7
± 0.09 J/cm2), the thermal oxide film was observed to be removed in a nearly discrete fashion, resulting in craters of depth approximately equal to the thickness of the film. For low laser fluence (< 0.7 ± 0.09 J/cm2), the thermal oxide film was observed to delaminate or buckle up from the Si(100) substrate forming a blister like feature (see Fig. 1). Similar blister like features have been observed to result from nanosecond pulsed laser irradiation of thin Al films [3]. In this work, a single-step technique is presented in which individual blister features are overlapped in rows to produce nanofluidic capillaries with a range of sizes.
0901-Ra16-36-Rb16-36.
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