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Thin Film Evaporation Systems: Ten-
Ion Beam Deposition System High Performance Planar Magnetrons Toxic Gas Adsorber for MOCVD Systems: Component for new or existing metal organic chemical vapor deposition (MOCVD) systems uses activated carbon to oxidize toxic gases, rather than the traditional caustic-liquid scrubbing process. The TGA-300 Series component is resistant to power failures, has over-temperature interlocks, a toxic gas monitor port, and an optional toxic gas detector. Leak-free adsorber has minimal maintenance and is currently used at more than 30 facilities. The 160 lb canister can be quickly and easily emptied and refilled with fresh adsorbent. Several models and sizes are available. EMCORE Corporation, 35 Elizabeth Avenue, Somerset, N] 08873; (201) 271-9090.
Toxic Gas Adsorber for MOCVD Systems Ion Beam Deposition System: Model 830 system offers increased control of film properties through independent ion beam energy, beam current, and incident angle variations. An 8 cm Kaufman-type ion source is used for sputter deposition from a four-sided, 5" target assembly. The 3 cm ion-assist deposition source provides property enhancement of deposited films through increased surface activation of the sample and is also used for sample precleaning. Cathode electron sources and a photometer are also provided. Commonwealth Scientific Corporation, 500 Pendleton Street, Alexandria, VA 22314.
High Performance Planar Magnetrons: Planar magnetrons, dc and rf, are available for high and ultrahigh vacuum operation, including large area and specialized deposition processes. Design of the 300 series ensures extended and economical target utilization, and allows a target as small as 20 mm diameter to be sputtered. Compounds, alloys, multilayers and complex materials such as high Tc superconductors can be produced by simultaneous or sequential deposition from a flangemounted cluster of 3 or 4 magnetrons. Ousters can also include a Saddle Field® fast atom beam cold cathode source for substrate cleaning, film densification or reactive depositions. Ion Tech Limited, 2 Park Street, Teddington, Middlesex TW11 OLT, England; 01-977 8275. Ion Implanter For Submicron Semiconductor Devices: High-current ion implanter for fabricating submicron semiconductor devices features 100% monitoring of implant dose; mean uptimes in excess of 250 hours (90% availability); adjustable implant angle; fully automated, intelligent, clampless air handling system with three independent load locks; automatic diagnostics; and real-time process
page brochure includes complete technical specifications for a wide selection of deposition systems for R&D and high throughput, including belljar evaporators, front loading systems, an optical coater, lift-off evaporation system, and load lock evaporation system. Accessories such as electron beam guns and power supplies, numerous fixture configurations, and sputtering sources are detailed. CVC Products, Inc., 525 Lee Road, P.O. Box 1886, Rochester, NY 14603; (716) 458-2550. PC-Controlled Plasma Systems: Sixpa
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