Short Course News

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MRS Short Course Program Continues Expansion The Short Course Program at the 1987 MRS Fall Meeting in Boston presented 29 courses on materials-related topics. It was the largest, most comprehensive educational program presented so far by the Materials Research Society, and the courses were extremely well attended. Nine new courses gave breadth to the MRS Short Course Program, whose technical thrust includes materials characterization, studies of advanced new materials, preparation and fabrication of materials, and processing/diagnostic techniques. The new courses on Conventional and HighTemperature Superconductivity, Scanning Tunneling Microscopy, Characteriz a t i o n of P o w d e r s a n d P o r o u s Materials, Scanning Electron Microscopy and X-Ray Microanalysis, and Atom Probe Microanalysis were particularly popular. Fourteen courses were designed and scheduled to directly complement symposia at the meeting. The Materials Research Society also provided 27 short course scholarships to full-time graduate/undergraduate students.

The Materials Research Society gratefully acknowledges the following organizations for their assistance in promoting the MRS Short Course Program: VG Instruments Inc., VG Ionex, Solid State Technology, SAMPE, American Association of Crystal Growth, JEOL, PerkinElmer, Quantachrome, R.D. Mathis, Morton Thiokol, Sula Technologies, Nanosil, Superconductor Week, Edgework Inc., Bruker Instruments, Spire Corporation, American Instruments Inc., Nissel Sangyo America, Ltd., Massachusetts Institute of Technology.

The Short Course Program at the 1988 MRS Spring Meeting in Reno, Nevada will present 23 courses. Two new courses will be offered. The first new course, Optoelectronic Materials, Processes and Devices, will survey the materials, processes and devices used in the rapidly advancing field of optoelectronics. It will emphasize the basic concepts and materials problems associated with devices such as lasers, detectors, liquid-crystal display, light emitting diodes, modulators, optical data storage and fibers. The course will complement Symposium P on Advanced Surface Processes for Optoelectronics. The second new course at the 1988 MRS Spring Meeting is titled Optical and Laser Techniques for Semiconductor Dry Process Diagnostics. Dry processing growth and fabrication technologies are assuming increasing importance for producing semiconductor devices. Optical and laser techniques provide important, non-invasive tools for increased understanding of process mechanisms and for process control. This course will overview relevant optical techniques and instrumentation which are important for semiconductor growth and fabrication. The

course will complement Symposium C on Process Diagnostics. In addition to the short course programs at its meetings, the Materials Research Society also presents "OnSite" courses for organizations upon request and subject to instructor availability. Through the team efforts of the MRS Continuing Education Committee chaired by Alton D. Romig Jr., the enthusiastic support