Showerhead-Assisted Chemical Vapor Deposition of Perovskite Films for Solar Cell Application
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MRS Advances © 2020 Materials Research Society DOI: 10.1557/adv.2020.126
Showerhead-Assisted Chemical Vapor Deposition of Perovskite Films for Solar Cell Application S. Sanders1, D. Stümmler1, J. D. Gerber1, J. H. Seidel1, G. Simkus1,2, M. Heuken1,2, A. Vescan1, and H. Kalisch1 1
Compound Semiconductor Technology, RWTH Aachen University, Sommerfeldstr. 18, 52074 Aachen, Germany
2
AIXTRON SE, Dornkaulstr. 2, 52134 Herzogenrath, Germany
ABSTRACT In the last years, perovskite solar cells have attracted great interest in photovoltaic (PV) research due to their possibility to become a highly efficient and low-cost alternative to silicon solar cells. Cells based on the widely used Pb-containing perovskites have reached power conversion efficiencies (PCE) of more than 20 %. One of the major hurdles for the rapid commercialization of perovskite photovoltaics is the lack of deposition tools and processes for large areas. Chemical vapor deposition (CVD) is an appealing technique because it is scalable and furthermore features superior process control and reproducibility in depositing high-purity films. In this work, we present a novel showerhead-based CVD tool to fabricate perovskite films by simultaneous delivery of precursors from the gas phase. We highlight the control of the perovskite film composition and properties by adjusting the individual precursor deposition rates. Providing the optimal supply of precursors results in stoichiometric perovskite films without any detectable residues.
INTRODUCTION Due to a steep rise in efficiency, organic-inorganic halide perovskite solar cells have attracted wide research attention in the past few years [1–3]. The maximum PCE of certified 25.2 % was achieved in 2019 using a Pb-based halide perovskite [4], rendering these devices a promising alternative to established wafer-based and thin-film solar cell technologies. However, one of the major challenges hampering commercialization is the lack of deposition tools for large areas [5]. Excluding spin-coating, which is limited to small substrate sizes, scalable processes like printing and doctor-blading suffer from poor layer morphology [6-7]. Thus, for upscaling and superior process control, gas phase methods like vacuum thermal evaporation and CVD have to be considered [8-10]. As a controlled sublimation of organo-halides in high vacuum is
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difficult [11], CVD is a more promising method, which allows for stable coevaporation processes with precise control of the individual precursors deposition rates. Up to date, several CVD processes for perovskites have been investigated, which normally are based on 2-step-approaches. Typically, in the first step, the metal halide film is fabricated by spin-coating or thermal evaporation, and only in the second step, an organo-halide precursor is depos
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