Single-Step Microstructure Patterning in Titania-Doped Sol-Gel Glassy Thin Films with Electron Beams
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EE13.47.1
Single-Step Microstructure Patterning in Titania-Doped Sol-Gel Glassy Thin Films with Electron Beams Xinshi Luo, Congji Zha and Barry Luther-Davies Research School of Physical Sciences and Engineering, Australian National University, Canberra ACT 0200, Australia Tel: 61-2-61250694, Fax: 61-2-61250029 Email: [email protected] Abstract To achieve a simplified microstructure patterning process, patterning in thin films with a singlestep exposure to UV-light or E-beam process for fabrication of integrated optical waveguides and components is of great interest in optics, because the complicated structure developing stage by wet chemical or plasma etching is not required. In this paper, we describe our study on the microstructure patterning in TiO2-doped hybrid glassy polymer thin films by irradiating with focused E-beam. An anhydrous sol-gel process based on hydrolysis and condensation of metal alkoxides with boric acid under non-hydrous conditions was applied to homogeneously incorporating TiO2 into silica network, and transparent glassy TiO2-doped thin films with varied TiO2 concentrations (up to 40 mol%) were prepared by spin coating the hybrid polymer onto fused silica substrates and silicon wafers. The TiO2-doped hybrid material showed a low OH absorption, low optical losses at the telecommunication windows (
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