Structural, Mechanical and Tribological Properties of TiN and CrN Films Deposited by Reactive Pulsed Laser Deposition
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Structural, Mechanical and Tribological Properties of TiN and CrN Films Deposited by Reactive Pulsed Laser Deposition A.R.Phani1 and J.E.Krzanowski2 1 Department of Physics, University of L’Aqula, INFM-CASTI Regional Laboratory, Via Vetoio-10, Copitto, L’Aquila-67010, ITALY 2 Department of Mechanical Engineering, University of New Hampshire, Durham, NH 03824, U.S.A.
ABSTRACT Nitride thin films have potential applications in different areas of silicon device technology, namely as diffusion barrier in metallization schemes, rectifying and ohmic contacts, and gate electrodes in field effect transistors. In the present investigation, TiN and CrN films have been deposited by reactive pulsed laser deposition technique using Ti and Cr targets at 10mTorr background pressure of N2. Si (100) and AISI 440C steel substrates were used for the present study. Films were deposited at different temperatures in the range of 200oC to 600oC. The deposited films exhibited densely packed grain, with smooth and uniform structures. X-ray Photoelectron Spectroscopy (XPS) analysis of the films showed and 50% Ti and 40% of N in TiN films, 45% of Cr and 45% of N in CrN films deposited on Si (111), with the balance mostly oxygen, indicating near stoichiometric composition of the deposited nitride thin films. Hardness of the films changed from 22 GPa at 200oC to 30 GPa at 600oC for TiN, whereas for CrN we obtained 26 GPa at 200oC to 31 GPa at 600oC. The residual stress in the films showed a change from compressive stress at 200oC to tensile stress at 600oC in both the cases. Friction coefficient of the films were measured by pin-on-disk technique for all films, up to the tested limit of 10,000 cycles at 1 N load and found to be very high (≥ 1) in both cases. INTRODUCTION Hard coatings play an important role in industry for improving tool lifetime and performance. TiN is one of the most commonly used and studied coatings, and has many beneficial properties including high hardness, low friction and chemical intertness1. There is however, still an industrial interest in coatings with further improved wear resistance, hardness, fracture toughness. Other transition metal nitrides have generated practical applications in industry as protective coatings; in particular CrN films have also shown high hardness, enhanced wear and corrosion resistance, excellent diffusion barrier properties and can be utilized as anti-wear and anti-corrosion coatings or as selective solar absorbers2. Many investigators have deposited TiN and CrN films by various techniques such as sputtering3 arc-evaporated4 and pulsed laser deposition5-6. Layered coating structures such as superlattices or nanostructured multilayers have also been investigated, such as TiN/Ti7, TiN/CrN8, TiN/NbN9, TiN/BN10. In the present study, we have deposited TiN and CrN films by reactive pulsed laser deposition and the deposited
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films are characterized for their structural, compositional, mechanical and tribological properties. EXPERIMENTAL PROCEDURE TiN and CrN films have been gr
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