TEM Observation of Microstructural Change of Silicon Single Crystal Caused by Scratching Tests Using SPM
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TEM Observation of Microstructural Change of Silicon Single Crystal Caused by Scratching Tests Using SPM M. Takagi, K. Onodera1, H. Iwata2, T. Imura, K. Sasaki3 and H. Saka3 Department of Mechanical Engineering, Aichi Institute of Technology, Toyota 470-0392, Japan 1 Graduate School, Aichi Institute of Technology, Toyota 470-0392, Japan 2 Department of Electrical and Electronics Engineering, Aichi Institute of Technology, Toyota 470-0392, Japan 3 Department of Quantum Engineering, Nagoya University, Nagoya 464-8603, Japan ABSTRACT In this study, the microstructural change of the surface of Si single crystal (Si(100)) after the scratching tests under very small loading forces was investigated. At first, line-scratching tests and scanning-scratching tests were carried out using an atomic force/friction force microscope (AFM/FFM). Next, cross-sectional TEM observations of the wear marks which were generated by the scratching tests were carried out. As a result of the TEM observations after the line-scratching tests, it was found that dislocations were observed in the area of less than 100nm thickness from the surface of the wear marks which were formed under the loading forces of more than 5μN. In the case of the loading forces of more than 20μN, an amorphous region was also observed just under the wear marks. As a result of the TEM observations after the scanning-scratching tests, it was found that the introduction of dislocations took place and no amorphous region appeared. It was also found that the several atomic layers at the top surface of the wear marks shifted in parallel to (100). INTRODUCTION Nanotribology is one of the key technologies for the practical use of NEMS or another engineering applications. The developments of a scanning-probe microscope (SPM), especially, an atomic force microscope (AFM), provided the new approaches for the studies on micro/nanotribology. A lot of investigations on the micro/nanotribological properties of various materials including hard thin films using these microscopes have been conducted since around 1990 [1-4]. On the other hand, the investigations on TEM observation of structural change caused by indentation or machining have been reported [5-7]. However, few experimental reports on micro/nanotribological behavior, i.e., the microstructural change of materials caused by micro/nanofriction have been available so far. The present authors have been studying on the microstructural change of the surface of Si single crystal after micro/nanofriction by using TEM, and the preliminary results obtained have been reported so far [8]. In the present study, the microstructural change of Si surface after scratching tests under very small loading forces was investigated by cross-sectional TEM observations in order to clarify the micro/nanotribological behavior. The effects of the loading forces on the microstructural change were also studied.
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EXPERIMENTAL DETAILS Line-scratching tests and scanning-scratching tests using an atomic force/friction force microscope (AFM/F
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