Ultrafast Pulsed Laser Deposition of Chalcogenide Glass Films for Low-loss Optical Waveguides
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Ultrafast pulsed laser deposition of chalcogenide glass films for low-loss optical waveguides B. Luther-Davies,1 V. Z. Kolev, 1 M. J. Lederer,1 R. Yinlan, 1 M. Samoc,1 R. A. Jarvis,1 A. V. Rode,1 J. Giesekus,2 K.-M. Du,2 and M. Duering2 1
Laser Physics Centre, Research School of Physical Sciences and Engineering, the Australian National University, Canberra, ACT 0200, Australia 2 Fraunhofer Institute for Laser Technique, Steinbachstr. 15, D-52074 Aachen, Germany
ABSTRACT Ultra-fast pulsed laser deposition using high-repetition-rate short-pulse lasers has been shown to provide high optical quality, super smooth thin films free of scattering centres. The optimized process conditions require short ps or sub-ps pulses with repetition rate in the range 1-100 MHz, depending on the target material. Ultra-fast pulsed laser deposition was used to successfully deposit atomically-smooth, 5micron thick As2S3 films. The as-deposited films were photosensitive at wavelengths close to the band edge (≈520 nm) and waveguides could be directly patterned into them by photo-darkening using an Argon ion or frequency doubled Nd:YAG laser. The linear and nonlinear optical properties of the films were measured as well as the photosensitivity of the material. The optical losses in photo-darkened waveguides were
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