A Combined TEM/RHEED, SEM/CL Study of Epitaxial GaN

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Mat. Res. Soc. Symp. Proc. Vol. 482 © 1998 Materials Research Society

Table 1 Summary of growth conditions used. sample

layer

subst.

substrate preparation

Tsubst

substrate desorbed at

650 C

0

doping

thickness

(or As flux)

(or growth time)

(1.2 x 10-5 torr of As)

-0.5/4m

GaN

GaP (001) I_ GaP

(As)

(001)

0 620 C.

MG192

GaN

GaAs (001)

substrate desorbed at 0 620 C

700 C

~102°cm-3 Si-doped

MG252

AIN(As) (180A GaAs cap) GaN (As)

GaP (001)

substrate desorbed at 0 620 C

650'C

(1.2 x 10-5 torr of As)

GaAs (001)

substrate desorbed at 0 620 C; 15min GaAs buffer.

7000C

GaN

GaAs (001)

substrate desorbed at 620°C; 15min GaAs buffer.

700 C

2xl017cm-3 Be-doped 5 (1.2 x 10torr of As) 18 3 2xl0 cmBe-doped (1.2 x 10-5 torr of As)

GaN

MG79

(As)

MG88

MG260

MG277

(As)

MG338

GaN

MG526

GaN

620°C substrate desorbed at

GaAs {i ii}B

subst. nitrided for 5 minutes as Ts ramped up from 620°C GaAs subst. nitrided for 6 { i ii}B minutes as Ts ramped up from 6000C

6200C 0

0

0

small P3-GaN grains in single crystal GaAs matrix I mixed phase with -O0.5/4m some degree of (1.5 hour) preferred orientation rotated ax-GaN 1.3/4m columnar grains with c-axis in owth direction polycrystalline (2 hours) (1 hour)

(4.2 x 10-6 torr of As)

700°C

690 C

comment

3

2x1019cmMg-doped

0.814m

single crystal 3-GaN with anisotropic distribution of

0.8/4m

mix of randomly oriented large grains

0.7pm

cc-GaN with 13-GaN inclusions

2.11m

single crystal (x-GaN

microtwins

lens on opening the camera chamber, and the only waiting time is for the camera chamber to pump down upon changing a specimen. Typically 4 or 5 samples can be examined within an hour. Bulk samples for RHEED observations were routinely plasma cleaned prior to immediate insertion into the microscope. The oxygen/argon plasma was operated at a pressure such that only hydrocarbon deposits were removed from a sample rather than inducing a gentle sputtering action. The effect of this was to minimise background amorphous glow, arising from sample handling, which sometimes hindered RHEED pattern acquisition. Electron transparent foils were prepared in plan view and cross-sectional geometries using conventional techniques [e.g. 6]. The cathodoluminescence (CL) from such foils was examined using an SEM equipped with an Oxford Instruments MonoCL2 system, while complimentary information gained from conventional TEM clarified the nature of the sample fine scale defect microstructure. RESULTS SEM/CL Combined With Conventional TEM The spatial and spectral uniformity of luminescence of TEM GaN foils was characterised using SEM/CL. The spectrum shown in Fig. la was recorded from a plan view nominally single crystal wurtzite GaN foil cooled to liquid nitrogen temperature. The two peaks in the CL spectra at 357.8nm and 386nm were used to form the images of Figs. lb and Ic. These peaks are centred at 3.47eV and 3.21eV corresponding to the ox and 0 phases of GaN respectively. The complimentary conventional TEM image from this plan view sample (Fig. ld) reveals t