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A COMPARISON BETWEEN ENERGETICS OF DECOMPOSITION AND PHOTO-DEPOSITION OF Pd AND Pt FROM Pd(C 5 H5 )(C 3 Hs) AND Pt(CsHs)(C 3 H5 )

KARL-HEINZ EMRICH", G.T. STAUF', W. HIRSCHWALD*, S. BARFUSS", P.A. DOWBEN, R.R. BIRGE, AND N.M. BOAG.** *Laboratory for Solid State Science and Technology, Syracuse University, Syracuse, New York 13244-1130 **Institut fiir Physikalische Chemie, Freie Universitat Berlin, Takustrasse 3, 1000 Berlin 33, Federal Republic of Germany ***Department of Chemistry and Applied Chemistry, Salford University, Salford, England

ABSTRACT The energetics of decomposition of a variety of organometallic compounds have been determined from photoionization mass spectroscopy and electron impact mass spectroscopy. In particular, Pd(CrH 5 )(C 3 H5 ) and Pt(C5 Hs)(C 3 HS) have been studied in this fashion, and the information used to make patterned Pd/Ni/Si heterostructures by laser induced photolysis of the palladium compound and nickelocene in vacuum (MOCVD). Contamination in the thin films was determined by Auger electron spectroscopy, and compared with that found by other researchers for photo-deposition of Pt from the cyclopentadiene allyl [1]. Thermodynamic data is used to explain differing contamination levels in the Pd and the Pt coatings.

INTRODUCTION The deposition of metal thin films by laser decomposition of metal alkyls and metal carbonyls has attracted considerable attention [2-4]. This method offers an attractive alternative to conventional photolithography processes in several applications, including photomask repair, real-time patterning of specialized circuitry, and in situ vacuum processing compatible with ion beam implantation. The focused nature of the laser beam prevents repair and fabrication processes from damaging nearby satisfactory areas, a problem with photolithography, and is ideal for selected area processing, in which it is used to promote CVD reactions [2]. While there is great interest in studying organometallic chemical vapor deposition (MOCVD or OMVPE) processes, only for a few source compounds have the energetics of decomposition been examined in detail. The rq-CsH5 (cyclopentadiene or Cp) and ,7 -C 3 Hs (allyl) ligands, in particular, are thought to make organometallic complexes which are well suited to use in MOCVD. Obviously, then, it is important to study the decomposition thermodynamics of some compounds of this type, to determine whether they are suitable for formation of pure metal thin films. Such studies have been done for ferrocene, nickelocene, and cobaltocene [5], as well as allylcyclopentadienyl palladium, or Pd(CsHs)(C 3 H5 ) [6]. These previous results for the palladium complex are herein compared to our recent studies of the similar compound, Pt(CsHs)(C 3 Hs). We will also discuss contamination results for the Pd coatings we have made from Pd(CsHs)(C 3 H5 ), demonstrating that it is a suitable organometallic source for the photolytic deposition of Pd in Pd/Ni/Si heterostructures.

EXPERIMENT The deposition chamber has been described previously [5]. Briefly, a

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