A simple and fast fabrication of a both self-cleanable and deep-UV antireflective quartz nanostructured surface
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NANO EXPRESS
Open Access
A simple and fast fabrication of a both self-cleanable and deep-UV antireflective quartz nanostructured surface Jung Suk Kim1†, Hyun Woo Jeong2†, Wonbae Lee3,4, Bo Gi Park2, Beop Min Kim2,3* and Kyu Back Lee2,3*
Abstract Both self-cleanability and antireflectivity were achieved on quartz surfaces by forming heptadecafluoro-1,1,2,2tetrahydrodecyltrichlorosilane self-assembled monolayer after fabrication of nanostructures with a mask-free method. By exposing polymethylmethacrylate spin-coated quartz plates to O2 reactive ion etching (RIE) and CF4 RIE successively, three well-defined types of nanopillar arrays were generated: A2, A8, and A11 patterns with average pillar widths of 33 ± 4 nm, 55 ± 5 nm, and 73 ± 14 nm, respectively, were formed. All the fabrication processes including the final cleaning can be finished within 4 h. All nanostructured quartz surfaces exhibited contact angles higher than 155° with minimal water droplet adhesiveness and enhanced transparency (due to antireflectivity) over a broad spectral range from 350 to 900 nm. Furthermore, A2 pattern showed an enhanced antireflective effect that extends to the deep-UV range near 190 nm, which is a drawback region in conventional thin-film-coating approaches as a result of thermal damage. Because, by changing the conditions of successive RIE, the geometrical configurations of nanostructure arrays can be easily modified to meet specific needs, the newly developed fabrication method is expected to be applied in various optic and opto-electrical areas. PACS codes: 06.60.Ei; 81.65.Cf; 81.40.Vw. Keywords: Antireflection, Superhydrophobicity, Nanostructure, Mask-free, Deep-UV
Background Numerous studies of surface nanostructures have been conducted to investigate enhancement of the properties of bulk materials to improve their selectivity, applicability, and effectiveness. During the past decades, the technological basis for nanofabrication has been developed by vigorous efforts to develop next-generation lithography for highly resolved patterns up to the industrial level of semiconductor production. Nanofabrication techniques using transparent materials such as quartz comprise one of the most attractive approaches to optical and opto-electrical studies as well as to highly sensitive biosensor fields since quartz is commonly employed in these fields [1-4]. * Correspondence: [email protected]; [email protected] † Equal contributors 2 Department of Interdisciplinary Bio/Micro System Technology, College of Engineering, Korea University, Seoul 136-701, Korea 3 Department of Biomedical Engineering, College of Health Science, Korea University, San 1, Jeongneung-3-dongSeongbuk-gu, Seoul 136-703, Korea Full list of author information is available at the end of the article
Various methods are used to achieve antireflective property in quartz or glass to increase light transmission. Single- or multilayered thin film coatings, porous coatings, and fabrication of sub-wavelength nanostructures on surfaces using conventional lithography have b
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