Analytical and Numerical Models of a Highly Sensitive MDM Plasmonic Nano-structure in Near-infrared Range

  • PDF / 2,269,936 Bytes
  • 6 Pages / 595.276 x 790.866 pts Page_size
  • 108 Downloads / 233 Views

DOWNLOAD

REPORT


Analytical and Numerical Models of a Highly Sensitive MDM Plasmonic Nano-structure in Near-infrared Range A. Jeddi Golfazani 1 & A. Alipour 1 & M. Bakhshipour 1 & Ali Farmani 1

&

Ali Mir 1

Received: 12 February 2020 / Accepted: 25 September 2020 # Springer Science+Business Media, LLC, part of Springer Nature 2020

Abstract Plasmon-induced transparency (PIT) is a spotlight technique for environmental monitoring. In this regard, a highly sensitive and tunable multilayer sensor including Ag–SiO2–Ag is presented in near-infrared range for both transverse mode (TE) and transverse mode (TM) modes at different incident waves. Actually, the proposed multilayer plasmonic sensor is presented to study the optical and sensing properties at near-infrared frequencies based on 3D finite-difference time-domain (FDTD). Sensitivity and tunability of all optical sensors are important parameters in their design, which are calculated based on propagation properties including absorption and reflection spectra, numerically and analytically. Results of absorption and reflection show that the proposed sensor has max sensitivity of 693.8 nm/RIU by Δn = 0.05 changing of middle refractive index and figure of merit (FoM) equal to 9.8. Also, the proposed nano-scale sensor can operate as a light propagation controlling with slow and fast light and multispectral sensor. By using silver metal in the sensor structure, the fast and slow light coefficient is obtained at 220 and 70, respectively. In addition, by increasing the incident angle of light, multiabsorption peaks are created which can be used as multiwindow sensor and PIT. The analytical results are in good agreement with the obtained results of coupled mode theory (CMT) method. Keywords Plasmonic sensor . Metal-dielectric-metal structure . Nano-structure . Absorber

Introduction Recently, plasmonic and metamaterial perfect absorbers have received great attention due to different applications in microwave, terahertz, near-infrared, and visible regions [1–4]. Also, perfect absorbers are used in several fields and applications including sensing [5], solar cell [6], refractive index sensor [7], and filters [8]. Wide and narrow band perfect absorbers are introduced as other classifications [9, 10] in which wide and narrow bands are used in solar cell and sensor, respectively. Plasmonic and photonic structures are studied in different applications of optical devices which can be used in absorber sensor [11, 12]. The photonic structure has high cost, complex fabrication, and large size. To overcome these drawbacks of photonic absorber, the plasmonic perfect absorber with several configurations are proposed. The typical absorber is

* Ali Farmani [email protected] 1

School of Electrical and Computer Engineering, Lorestan University, Khorramabad, Iran

composed of two configurations including metal-dielectric and metal-dielectric-metal (MDM) structures [13, 14]. To achieve narrowband, tunability and multispectra are suggested. Also, MDM structure is used widely in detector and sensor [15, 16].