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CHARACTERIZATION OF AMORPHOUS CARBON FILMS BASED ON CARBON, NITROGEN, AND HYDROGEN*. H. EFSTATHIADIS*, Z. AKKERMAN*, AND F. W. SMITH* *Physics Department, City College of New York, New York, NY 10031. ABSTRACT A series of amorphous hydrogenated carbon-nitrogen alloy films (a-CxNyHz) has been prepared via plasma-enhanced chemical vapor deposition from mixtures of nitrogen and acetylene. It is found that as the ratio R=N 2/C 2 H 2 is increased from zero to 100, the nitrogen incorporation into the films is increasing while the deposition rate is decreasing for 0

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