Characterization of Palladium Acetylacetonate as a CVD Precursor for Pd Metallization
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CHARACTERIZATION OF PALLADIUM ACETYLACETONATE AS A CVD PRECURSOR FOR Pd METALLIZATION Steven P. Kowalczyk*, Michael Li'gdlund**, Mats Fahlman**. and William R. Salaneck** *IBM Research. T. J. Watson Research Center. Yorktown Heights, N. Y., 10598 "**Departmentof Physics, Link6ping University, Link6ping, Sweden
ABSTRACT Palladium acetylacetonate has received much consideration as a possible precursor for chemical vapor deposition of metallic palladium films for a variety of microelectronic applications. We have studied the adsorption and decomposition of palladium acetylacetonate on gold, polyimide, silicon and silver surfaces to understand the initial mechanisms of metallic palladium film formation. In situ x-ray photoelectron spectroscopy was used to characterized the films after adsorption and their decomposition after thermal treatment or laser irradiation. INTRODUCTION Palladium thin films have a number of potential applications in microelectronics due to their conductivity, corrosion resistance and low cost. Pd is especially suitable as a catalyst for electroless plateup of other metals such as copper [1,2]. This has led to a number of investigations of preparing thin palladium films or patterns by laser assisted chemical vapor deposition (LACVD) from organopalladium precursors. Popular precursors have been palladium acetate (PdAc) [3-6] and palladium acetylacetonate (PdAcAc) [7]. Other precursors that that been investigated include palladium hexafluoroacetylacetate [7], allylcyclopentadienyl palladium [8-11], bis allyl palladium [ II], and bis (2-methylallyl) palladium [ 1]. These previous studies have mostly concentrated on determining the film properties (resistivity, purity, etc), or demonstrating patterning capabilities. We have begun to study the LACVD process with in situ photoelectron spectroscopy utilizing cryogenic sample handling capabilities to molecularly adsorb films of precursor molecules and follow their decomposition upon either thermal treatment or laser irradiation. In this paper, we report our inital studies of PdAcAc. Previous studies of PdAc and PdAcAc were done on films prepared by spin casting from solution [3-7]. Our experiments are the first to prepare films of PdAcAc by vapor deposition. The substrates investigated in these experiments were gold, silicon, silver and polyimide. For the adsorption of PdAcAc, the substrates were either at -55"C or room temperature. The films were characterized by x-ray photoelectron (XPS) core-level spectra, which were used to demonstrate the chemical composition of the films. The films were subjected to thermal treatment and Ar ion laser irradiation to study the decomposition of PdAcAc. EXPERIMENTAL The photoemission system has been previously described [12]. It consists of three separate chambers, an introduction chamber for loading sample substrates, a preparation chamber for substrated cleaning (thermal or Ne+ ion bombardment), low temper-
Mat. Res. Soc. Symp. Proc. Vol. 282. @1993 Materials Research Society
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ature molecular dosing and laser
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