Comparison of two Metal Ion Implantation Techniques for Fabrication of Gold and Titanium Based Compliant Electrodes on P
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1188-LL03-09
Comparison of two Metal Ion Implantation Techniques for Fabrication of Gold and Titanium Based Compliant Electrodes on Polydimethylsiloxane Muhamed Niklaus, Samuel Rosset, Philippe Dubois, Herbert R. Shea Ecole Polytechnique Fédérale de Lausanne (EPFL), Institute of Microengineering (IMT), Microsystems for Space Technologies Laboratory (LMTS), Rue Jaquet-Droz 1, 2002 Neuchâtel, Switzerland. ABSTRACT This study contrasts the implantation of 25 µm thick Polydimethylsiloxane (PDMS) membranes with titanium and gold ions at 10 keV and 35 keV for doses from 1x1015 at/cm2 to 2.5x1016 at/cm2 implanted with two different techniques: Filtered Cathodic Vacuum Arc (FCVA) and Low Energy Broad Ion Beam (LEI). The influence of the ion energy, ion type, and implantation tool on the Young’s modulus (E), resistivity and structural properties (nanocluster size and location, surface roughness) of PDMS membranes is reported. At a dose of 2.5x1016 at/cm2 and an energy of 10 keV, which for FCVA yields sheet resistance of less than 200 Ω/square, the initial value of E (0.85 MPa) increases much less for FCVA than for LEI. For gold we obtain E of 5 MPa (FCAV) compared to 86 MPa (LEI) and for titanium 0.94 MPa (FCVA) compared to 57 MPa (LEI). Resistivity measurements show better durability for LEI than for FCVA implanted samples and better time stability for gold than for titanium. INTRODUCTION Using metal ion implantation (MII) we developed a method that allows micropatterning of very compliant and optically transparent electrodes that can sustain high strains and millions of cycles, and can be used to fabricate buckling type membrane actuators with a vertical displacement of more than 25 % of the membrane’s diameter [1]. Starting with a PDMS membrane with a Young’s modulus 0.85 MPa, Au ion implantation at 5 keV for doses of order 1016 ions/cm2 results in less than 1 MPa increase in Young’s modulus, electrical conductivity below 1 kΩ/ square, and strain of over 175% can be reached while remaining conductive. In this paper we will present the influence of two different implantation techniques on mechanical, structural and electrical properties of Polydimethylsiloxane (PDMS) implanted with Ti and Au, at 10 keV and 35 keV, and doses between 0.1x1016 at/cm2 and 2.5x1016 at/cm2. EXPERIMENTAL SETUP The two implantation instruments, used in this study, were Filtered Cathode Vacuum Arc (FCVA) and Low Energy Broad Beam (LEI) implanter. FCVA creates 600 µs long pulses of plasma with a beam current of 300 µA/cm2. Pulse rate is of order 1 Hz. The beam is filtered from macroparticles, yielding mostly doubly charged ions. In our case, the beam is then accelerated toward the target with an acceleration potential of 5 kV. The acceleration potential drops during each pulse because of the current from the 17.5x1012 at/cm2 doubly charged ions. LEI delivers a continuous ion current of about 0.5 µA/cm2. The ion beam is filtered, accelerated and decelerated
at the desired energy. Beam energy is stable in time. Averaged over one second, the ion cur
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