Diffusion of Au in Amorphous Si During Ion-Beam Irradiation

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Diffusion of Au in Amorphous Si During Ion-Beam Irradiation F. pRIOLO*(a), J. M. POATE*, D. C. JACOBSON*, J. LINNROS*(b) J. L. BATSTONE*(c) and S. U. CAMPISANO** *AT&T Bell Laboratories, Murray Hill, NJ 07974 "**University of Catania, Sicily, Italy

ABSTRACT We have measured the radiation-enhanced diffusion of Au in amorphous Si in the temperature range 77-700 K. Gold was implanted to depths of 500A at concentrations of an atomic %. The samples were than amorphized to depths of -2gm using MeV Ar implants at liquid nitrogen temperature. Radiation-enhanced diffusion was induced by a 2.5 MeV Ar beam at doses of 2x101 -2x10 17 /cm2 and dose rates of 7x10 12 -7x101 /cm 2 sec. The diffusion coefficients show three well defined regions. At temperatures