Electrodeposition of Si and Sn-based Amorphous Films for High Energy Novel Electrode Materials
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Electrodeposition of Si and Sn-based Amorphous Films for High Energy Novel Electrode Materials
S.Gallanti1, M. J. Loveridge1, R. Bhagat1 1
Electrochemical Engineering Group, WMG, University of Warwick, CV4 7AL, Coventry, UK
ABSTRACT In this work we report the electrodeposition parameters of Sn-graphene films in aqueous solutions and silicon films in propylene carbonate. The galvanostatic electrodeposition of tingraphene films from a sulfate-based acidic solution on copper substrates has been studied evaluating the effect of stirring on the morphology and the electrochemical performance. SEM analysis of films deposited galvanostatically at -10 mA.cm-2 for 20 minutes at 25 °C reveals that electrodeposition is suitable to generate continuous and homogeneous films with thickness values in the micrometer range. XRD analysis shows many intermetallic Cu-Sn crystalline phases are formed, as opposed to a pure amorphous tin layer. So far, electrochemical characterization has only been performed over a short number of charge-discharge cycles. The galvanostatic electrodeposition of silicon from propylene carbonate in galvanostatic mode has been carried out, but is currently extremely challenging to obtain continuous and homogeneous films. The XRD characterization has suggested the possible presence of amorphous phases in the films deposited at -1.0 mA.cm-2 for 30 minutes at 25 °C.
INTRODUCTION In order to replace capacity-limited graphite anodes (372 mAh/g), this study aims to develop novel, high-density-amorphous anode materials for versatile applications in both Li-ion and Naion batteries. In particular, we focus on the electrodeposition of Si- and Sn-based anodes to establish whether this technique is suitable to obtain amorphous materials for long cycle life and durability. Electrodeposited electrodes do not need conductive agents or binders and are therefore inherently more energy dense. Electrodeposition is also low-cost and scalable technique. Additionally, solid electrolyte type materials such as ionomeric and/or ionically conducting ceramic films can be applied to deposited films as artificial SEI-type films to suppress electrolyte decomposition at low voltages and prevent the growth of the SEI [1]. This work shows the preliminary results on the electrodeposition of tin and silicon in aqueous and organic media respectively. Sn electrodes are susceptible to volume change (≈300 vol. %), but this can be limited by using carbonaceous co-materials such as graphene to decrease the crystallite sizes [2] and
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increase in-plane electrical conductivity, surface area and excellent mechanical resistance [3]. In this study, we investigated the effect on morphology, crystalline structure and electrochemical behavior of the electrodeposited films as graphene addition is made into a Sn-sulfate ba
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