Electron Irradiation of 4H SiC by TEM: An Optical Study
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1
2000
16
1
16
-2
-2
2
1
2000
2
1500
1
4250
1
1
4300
1
1
4350
4400
4250
1
4300
1
1
4350
4400
4350
4400
4350
4400
4000
4000
17
-2
17
-2
2000
2000
4250
1
1
4300
4350
4400
4250
4300
12000
12000
18
-2
18
6000
6000
4250
-2
4300
4350
4400
4250
4300
H6.5.3
5
10 3000
d2 c
4H SiC
(b)
b1
d1
g2
e2 d4
a1
a2
2000
c3
1000
d1
4000
x 20
3
10
T = 2K
c2
3000
4
10
Intensity
Relative Intensity (a.u.)
(a)
4H SiC
T = 20K
4
c2
2
10
e1 g2 g1
2000
f1
L1
1000 4260
4280
c1 d2
4300
4320
4340
a1
b1 4380
4400
4420
( ∆E = 47meV; Egx - E b= 429meV ) ( ∆E = 37meV; Egx - Ed = 414m
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