Elementary Physics of Complex Plasmas
Complex plasmas are dusty plasmas in which the density and electric charges of the dust grains are sufficiently high to induce long-range grain-grain interactions, as well as strong absorption of charged-plasma components. Together with the sources replen
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agglomerates of dust grains: found in etching devices, 51 agglomerates of grains: fractal shape, 54 agglomeration of grains, 25, 212, 213, 322 anisotropic screening, 259 applicability criterion: for OML approach, 90 attachment coefficient, 210 attraction forces between grains, 26, 223,314 attraction of grains, 86, 247 attraction potential well, 231 basic state of complex plasmas, 141 basic state: equations, 146 basic state: of complex plasmas, 144, 158 binary correlation function, 263 Bohm criterion, 247 Boltzmann distribution, 69, 71 boundary free 2D clusters, 326 boundary free clusters, 320, 321, 329 boundary free: dust surface, 351 boundary free: dust void, 339 change of grain charges with inter-grain distance, 201 charge fluctuations, 191, 192 charge fluctuations: induced by dust, 193 charge fluctuations: non-collective, 189 charge-exchange collisions, 81 charging coefficient, 114
charging damping, 154 charging frequency, 91, 142 charging length, 93 charging of grains, 67, 72 charging time, 68, 98, 115 charging: by super-thermal particles, 98 charging: diffusion limited model, 109 charging: in strong magnetic field, 99 charging:radial drift model, 106 cluster shell, 313 cluster size, 308, 315 cluster: equilibrium size, 321 clusters stability, 308 clusters: energy for ionization and dissociation, 324 clusters: global modes, 315 clusters: three dimensional, 328 clusters: two dimensional, 305, 314 clusters:self-confinement, 313 coefficient: of collective attraction, 221 collective attraction, 157, 217, 221, 267 collective attraction: for linear screening, 215, 281 collective attraction: for non-linear screening, 227 collective attraction: in magnetic field, 225 collective attraction: of grains, 361 collective effects, 198, 203 collective effects in screening, 85 collective fluxes, 216 collective interactions, 26, 189, 197 collective modes, 141, 165, 169
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Index
collective modes: excited by fast grains, 165 collective modes: in external magnetic field, 184 collective non-linear attraction, 216 collective pair interactions, 2, 199 collective plasma flux, 21 collective screening factor, 221 collisions of grains, 238 complex plasma physics: used in etching industry, 52 complex plasma self-organization, 36 complex plasmas: as open system, 18 complex plasmas: dissipation processes, 31 complex plasmas: highly dissipative, complex plasmas: liquid states in magnetic field, 57 complex plasmas: new magnetic materials, 56 complex plasmas: new principles used computer technology, 48 complex plasmas: new surfaces production, 54 complex plasmas: non Hamiltonian system., 17 complex plasmas: related environmental problems, 62 complex plasmas: self -energy, 2 complex plasmas: selforganization, 2 complex plasmas: thermodynamically open, 1 complex plasmas:main differences with ordinary matter, 1 contamination by dust: collective cloud instabilities, 50 continuity equation, 116, 123 correlation function, 187, 329 Coulomb clusters, 306 Coulomb energy, 201 coupling constant, 8, 248, 271, 278, 283 coupling constant: between fluxes
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