Fabrication and Surface Morphology of YBCO Superconducting Thin films on STO Buffered Si Substrates
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Fabrication and Surface Morphology of YBCO Superconducting Thin films on STO Buffered Si Substrates Zafer Mutlu1, Yasar G. Mutlu2, Mucahit Yilmaz3, Oguz Dogan3, Mihrimah Ozkan4, Cengiz S. Ozkan5, 1 1 Department of Materials Science & Engineering, University of California-Riverside, Riverside, CA 92521, USA 2 Department of Physics, Selcuk University, Selcuklu, 42079, Turkey 3 Department of Physics, A. K. Education Faculty, Konya University, Konya, 42090, Turkey 4 Department of Electrical Engineering, University of California-Riverside, Riverside, CA 92521, USA 5 Department of Mechanical Engineering, University of California-Riverside, Riverside, CA 92521, U.S.A
ABSTRACT Pulsed Electron Deposition (PED) is an attractive alternative to Pulsed Laser Deposition (PLD) for growing high temperature superconductor thin films because of its relatively low cost. In this study, YBa2Cu3O7-δ (YBCO) thin film has been fabricated on silicon substrates by Pulsed Electron Deposition technique. SrTiO3 (STO) as a buffer layer has been grown between Si substrate and YBCO superconducting layer. The crystalline structures of STO/Si and YBCO/STO/Si films have been investigated by x-ray diffraction (XRD). The surface morphology and microstructure of YBCO/STO/Si thin film have been characterized with atomic force microscope (AFM) and scanning electron microscope (SEM). From the θ-2θ XRD analysis of YBCO thin films, (00l) diffraction peaks are obtained indicating they have a poor c-axis oriented structure. SEM analysis shows that the surfaces of films are crack-free, but they have some particulates. On AFM images, the droplets are clearly observed leading to a roughly surface. INTRODUCTION The method of pulsed electron deposition (PED) has recently become an alternative to PLD as a means for producing thin films. PED shares some of the same advantages that characterize PLD for vacuum deposition. Among these are modest requirements for vacuum, easy control of film thickness, easy set-up, and multicomponent film stoichiometry nearly identical to target material, and a relatively high deposition rate with low consumption of target materials. In addition, PED works for UV-transparent materials where PLD might fail [1]. Shortly, PED has several advantages, making this technique appealing for application processes: low cost apparatus, optimal stoichiometry control, high growth rate, large area deposition and low crystallization temperature [2]. The challenge for the commercialization of YBCO coated conductors is the development of a low cost manufacturing process to allow for a cheap, fast and continuous deposition of superconducting coatings with high electrical performance [3]. PED technique is a good candidate to meet the demand. Using PED, several research groups have successfully grown YBCO thin films on STO [4], LaAlO3 [5] and Ni-W [3] substrates. A study of the deposition of
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YBCO on STO buffered Si substrate by PED has not yet been realized. Our research has thus been focused on the possibility of fabricating the YBCO thin film on ST
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