Fabrication of Nanoimprint Stamps by Nanosphere Lithography
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Fabrication of Nanoimprint Stamps by Nanosphere Lithography Chun-Wen Kuo, Jau-Ye Shiu, Yi-Hong Cho and Peilin Chen* Institute of Applied Science and Engineering Research, Academia Sinica, 128, Section 2, Academia Road, Nankang, Taipei 115, Taiwan
Abstract A novel scheme for the fabrication of large-area nanoimprint stamps has been developed based on the utilization of a combination of nanosphere lithography and reactive ion etching. Both single and double layer polystyrene beads have been employed to construct well-ordered, periodic silicon nanopillar arrays. The nanopillar arrays fabricated by this method have been successfully used as the stamps for nanoimprint lithography. Our result indicates that this approach is capable of producing large-area sub-50 nm periodic nanostructures.
Introduction Periodic nanostructures are of great research interests, because of their potential applications in photonic crystals [1-3], data storage [4-6], and sensors [7-8]. To fabricate periodic nanostructures with feature size less than 100 nm, normally it requires e-beam lithography. However, it is time consuming and costly to use e-beam lithography for the large-scale fabrication. Therefore, it is very important to develop alternative high-throughput, inexpensive large-scale nanofabrication techniques. Among various alternative nanofabrication methods, those utilized self-organization process have drawn lots of research attention, because of their accessibility and low-cost. Colloidal lithography is one of such techniques that utilize the close packed structures formed by monodisperse nanoparticles as the templates for the construction of nanostructures. This approach is capable of producing large-area periodic nanostructures with sufficient size control in the sub-100 nm region [9]. It has been demonstrated that both two-dimensional [10-15] and three-dimensional [16-18] well-ordered crystalline structures can be obtained by colloidal lithography. In this paper, we report the development of a new fabrication process to produce large-area periodic nanopillar arrays as nanoimprint stamps. Nanoimprint lithography [19-20] is a promising technique that is capable of replicating large-area nanostructures with lateral resolution better than 10 nm. So far the stamps used in nanoimprint lithography are mainly fabricated by e-beam lithography, which limits it utilization in the field of fundamental research. Our idea is to employ a combination of nanosphere lithography and reactive ion etching to produce large-area periodic nanopillar arrays on silicon
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substrates. Nanosphere lithography, which utilizes two-dimensional close packed structure formed by monodisperse polystyrene beads as templates, has been demonstrated capable of producing well-ordered nanoparticle arrays up to 1 cm2. When these nanoparticle arrays are used as etching mask, large-area nanopillar arrays can be easily fabricated on silicon substrate. Our approach offers several advantages over conventional e-beam lithography to produce sub-100nm periodic n
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