Fabrication of Diamond-Like Carbon Emitter Patterns by Room-Temperature Curing Nanoimprint Lithography with PDMS Molds U
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Fabrication of Diamond-Like Carbon Emitter Patterns by RoomTemperature Curing Nanoimprint Lithography with PDMS Molds Using Polysiloxane Shuji Kiyohara, Shogo Yoshida, Ippei Ishikawa, Toru Harigai, Hirofumi Takikawa, Masahiko Watanabe, Yoshinari Sugiyama, Yukiko Omata and Yuichi Kurashima MRS Advances / Volume 1 / Issue 16 / January 2016, pp 1075 - 1080 DOI: 10.1557/adv.2016.49, Published online: 26 January 2016
Link to this article: http://journals.cambridge.org/abstract_S2059852116000499 How to cite this article: Shuji Kiyohara, Shogo Yoshida, Ippei Ishikawa, Toru Harigai, Hirofumi Takikawa, Masahiko Watanabe, Yoshinari Sugiyama, Yukiko Omata and Yuichi Kurashima (2016). Fabrication of Diamond-Like Carbon Emitter Patterns by RoomTemperature Curing Nanoimprint Lithography with PDMS Molds Using Polysiloxane. MRS Advances, 1, pp 1075-1080 doi:10.1557/adv.2016.49 Request Permissions : Click here
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MRS Advances © 2016 Materials Research Society DOI: 10.1557/adv.2016.49
Fabrication of Diamond-Like Carbon Emitter Patterns by Room-Temperature Curing Nanoimprint Lithography with PDMS Molds Using Polysiloxane Shuji Kiyohara1, Shogo Yoshida1, Ippei Ishikawa1, Toru Harigai2, Hirofumi Takikawa2, Masahiko Watanabe3, Yoshinari Sugiyama3, Yukiko Omata3, Yuichi Kurashima4 1
Electric and Electron System Engineering Course, Department of Multidisciplinary Engineering, Faculty of Advanced Engineering, National Institute of Technology, Maizuru College, 234 Aza Shiroya, Maizuru, Kyoto 625-8511, Japan 2 Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, 1-1 Hibarigaoka Tempaku, Toyohashi, Aichi 441-8580, Japan 3 Application and Technical Section, ELIONIX INC., 3-7-6 Motoyokoyama, Hachioji, Tokyo 192-0063, Japan 4 Research Center for Ubiquitous MEMS and Micro Engineering, National Institute of Advanced Industrial Science and Technology, 1-2-1 Namiki, Tsukuba, Ibaraki 305-8564, Japan ABSTRACT We investigated the fabrication of diamond-like carbon (DLC) emitter patterns by roomtemperature curing nanoimprint lithography (RTC-NIL) with polydimethylsiloxane (PDMS) molds using polysiloxane, as an application to the emitter for the next generation flat panel display. The DLC which has excellent properties similar to diamond properties was used as a pattern material. A PDMS was used as a mold material and fabricated by the following optimum conditions of the first curing time at RT for 36 h and the second curing time at the temperature of 150 Υfor15 mins. The polysiloxane is in the state of sticky liquid at RT and stable in air. Therefore, the polysiloxane was used the electron beam (EB) resist and oxide mask material in EB lithography, and also used as RT-imprint material. First, we fabricated the PDMS mold with pit array. Each dot is 5 μm-diameter and 400 nm-depth. We carried ou
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