Fundamental Properties and Nano-imprintabilities of Zr-, Pd- and Cu-based Glassy Alloy Thin Films
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Fundamental Properties and Nano-imprintabilities of Zr-, Pd- and Cu-based Glassy Alloy Thin Films Kana Takenaka1, Noriko Saidoh1, Nobuyuki Nishiyama1 and Akihisa Inoue2 1 RIMCOF-Tohoku Univ. Lab., The Materials Process Technology Center, Katahira 2-1-1, Sendai 980-8577, Japan 2 Tohoku Univ., Katahira 2-1-1, Sendai 980-8577, Japan ABSTRACT With the aim of investigating fundamental properties and nano-imprintabilities of glassy alloy in the film form, Zr49Al11Ni8Cu32, Pd39Cu29Ni13P19 and Cu38Zr47Al9Ag6 alloy thin films were fabricated on Si substrate by a magnetron sputtering method. These thin films exhibit distinct glass-tradition phenomenon and large supercooled liquid region of about 80 K, confirming as a glassy structure and have very smooth surface and sufficient hardness to maintain imprinted shape, which are suitable for nano-imprint processing. Moreover, thermal nano-imprintabilies of these obtained films are demonstrated by using a dot array mold with a dot diameter of 90 nm and a pitch of 180 nm. Surface observations revealed that periodic nanohole arrays were successfully imprinted on the surface of these films and precisely corresponded to the periodic dot pattern of the mold. Particularly, Pd-based glassy alloy thin film indicated more precise pattern imprintability, namely, more flat residual surface plane and sharper hole edge. These results suggest that these glassy alloy thin films, especially Pd-based glassy alloy thin film have high potential for application to the nano-imprinting materials. INTRODUCTION Recent progress of information technology equipments is remarkable, especially in the field of hard disk drive with high recording data density [1]. Bit patterned media recording data onto individual dots in a magnetic nano-dot array, is one of the most promising candidates for high density data storage devices [2]. Hence, magnetic nano-dot arrays has been tentatively fabricated by various processes [3,4]. Among of them, the process using a nano-imprint lithography becomes a promising candidate to fabricate nano-structured surface pattern due to the high throughput, easy operation and good cost-effectiveness. In this process, magnetic dots are deposited into nano-hole arrays, which are generated via compression molding of a deformable polymer by a hard inorganic mold with a desired dot array pattern. Materials for imprinting are required to have thin film form, smooth surface, high shape-holdability and high hardness at room temperature. Conventionally used polymers for imprinting such as PMMA have excellent transcribe ability, however, mechanical properties and shape-holdability are generally insufficient [5]. Recently, glassy alloys (GAs) attracted much attention as imprinting materials because of their useful polymer-like characteristics, as well as high hardness at room temperature and excellent corrosion resistance [6,7]. As compared with the polymer for imprinting, most GAs have sufficient mechanical properties and exhibit higher glass transition temperature (Tg), leading to high shape-holdab
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