High Energy Focused Ion Beam Nanoprobes: Design and Applications
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High Energy Focused Ion Beam Nanoprobes: Design and Applications Gary A. Glass,1 Bibhudutta Rout, 1 Alexander D. Dymnikov,1 Elia V. Eschenazi,2* Richard R. Greco,3 and Daniel P. Zachry1 1 Louisiana Accelerator Center, University of Louisiana at Lafayette, Lafayette, LA, 70504-2410. 2 Department of Physics and Dual Degree Engineering, Xavier University of Louisiana, New Orleans, LA, 70125. 3 Los Alamos National Laboratory, Los Alamos, NM 87545 ABSTRACT An overview of the present state of high energy focused ion beam (HEFIB) system technology, nanoprobe system design and specific ion beam writing applications will be presented. In particular, the combination of P-beam, heavy-ion writing and ion implantation to produce microstructures in resists and silicon will be demonstrated. Heretofore, the development of HEFIB technology worldwide has progressed through a series of developments at independent research facilities, each having relatively narrow and mostly isolated, research purposes. However, a complete, versatile HEFIB nanoprobe system capable of both analysis and modification will require the combination of several component systems, each with specialized technology, and significant advances in the design of a complete system can only be expected from an effort that includes a coordinated development of the component parts. INTRODUCTION Understanding the physical, chemical and mechanical properties of materials on a nanodimensional scale, and the ability to alter those properties in a controlled manner, is a necessary precursor to developing useful technological applications of nanomaterials. Consequently, there is a continuing and critical need for novel instrumentation with which nanomaterials properties can be observed, measured, altered and utilized. Nowhere is that need more evident than when considering the investigation or alteration of properties of non-surface regions inside nanometersized structures. The nanoscale probes predominantly in use (e.g., scanning electron and atomic force microscopy) either provide volume-averaged or surface structure property information with little or no capability to “see” or “modify” below surfaces. High energy ions can penetrate well below surfaces of materials and, as a result, can offer a means by which sub-surface regions can be studied and/or manipulated. By focusing these ion beams to nanometer-sized probes and developing associated specialized techniques, unique analyses and manipulations of the nanoworld are possible. With the advent of new manufacturing technologies applied to lens systems and ion sources, enhancements of ion source brightness, and improved energy resolution and stability of high energy ion accelerators, it has become possible to demagnify high energy (MeV) ion beams to sub-micron dimensions with high current densities. The technology to focus MeV ion beams to spot sizes less than 1 µm has been developed during the last few decades and has spawned a wide range of applications not available through other techniques. A high energy fo
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