Influence of Cold Atmospheric Pressure Plasma on Pea Seeds: DNA Damage of Seedlings and Optical Diagnostics of Plasma
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Influence of Cold Atmospheric Pressure Plasma on Pea Seeds: DNA Damage of Seedlings and Optical Diagnostics of Plasma J. Tomeková1 · S. Kyzek2 · V. Medvecká1 · E. Gálová2 · A. Zahoranová1 Received: 14 February 2020 / Accepted: 27 July 2020 © Springer Science+Business Media, LLC, part of Springer Nature 2020
Abstract Cold atmospheric pressure plasma treatment is currently being explored as an alternative way to improve the germination and growing parameters of plant seeds. However, it is important to pay attention to the effect of plasma treatment on DNA damage of the seeds as well as detailed characteristics of plasma composition and parameters. The aim of this work was to study the DNA damage of plasma-treated pea seeds (Pisum sativum L.) and plasma parameters such as the chemical composition of plasma gaseous compounds and plasma radiation. Seeds were treated with plasma using the diffuse coplanar surface barrier discharge generated in different working gases (ambient air, nitrogen, oxygen and different mixtures of oxygen and nitrogen) at atmospheric pressure and at 60 s, 180 s and 300 s exposure times. DNA damage was studied using the single cell-gel electrophoresis called the comet assay and the plasma parameters were investigated by Fourier transform infrared spectroscopy and optical emission spectroscopy. Experiments in different ratios of oxygen and nitrogen were realized in order to understand the reaction mechanism between the ambient air plasma and the treated seeds. Based on our results, ambient air plasma appears to be the most advantageous for the plasma treatment due to no significant DNA damage because of the proper combination of plasma composition in combination with water vapor present in ambient air. Keywords Low-temperature plasma · Optical emission spectroscopy · Fourier transform infrared spectroscopy · Pea seeds · DNA damage
Introduction Low-temperature plasma (LTP) generated at atmospheric pressure, often referred in literature as cold atmospheric pressure (CAP) plasma, is currently frequently used for the surface modification of different materials. This is because plasma generally represents * J. Tomeková [email protected] 1
Department of Experimental Physics, Faculty of Mathematics, Physics and Informatics, Comenius University, Mlynská dolina F1, 842 48 Bratislava, Slovakia
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Department of Genetics, Faculty of Natural Sciences, Comenius University, Ilkovičova 6, Mlynská dolina, 842 15 Bratislava, Slovakia
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Plasma Chemistry and Plasma Processing
a low-cost and environmentally friendly alternative to the usual way using harmful chemicals. In addition, CAP plasma is generated without the need of low-pressure equipment, and ambient air can be used as a working gas. Plasma technology based on CAP devices is also appropriate considering the increased demands for cost reduction and environmental protection [1–3]. CAP plasma consists of several different kinds of reactive species, electrons, ions, UV radiation, radicals and metastable particles and
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