Influence of substrate and Ar/N 2 gas flow ratio on structural, optical and electrical properties of TiN thin films synt
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Influence of substrate and Ar/N2 gas flow ratio on structural, optical and electrical properties of TiN thin films synthetized by DC magnetron sputtering Peng Gu1 · Xinghua Zhu1,2 · Jitao Li1 · Haihua Wu1 · Dingyu Yang1 Received: 16 January 2018 / Accepted: 2 April 2018 © Springer Science+Business Media, LLC, part of Springer Nature 2018
Abstract Titanium nitride (TiN) thin films have been prepared by direct-current reaction magnetron sputtering technique on different substrates (glass and Si) and the influence of substrate and Ar/N2 gas flow ratio on structural, optical and electrical properties of TiN thin films were discussed. X-ray diffraction suggested that with the ratio of Ar/N2 decreasing, the diffraction intensity of (111) plane gradually diminished while (200) plane increased and films on Si substrate exhibited better crystalline quality than glass substrate. Improvement of Ar/N2 ratio is contribute to enhance the deposition rate and the obvious surface roughness were observed when the ratio up to 49. Photoluminescence spectra showed that TiN films on Si substrate showed higher intrinsic emission and lower defect emission. Moreover, the resistivity of TiN films showed obviously decreasing as the flow rate ratio of Ar/N2 increased, especially films on Si substrate.
1 Introduction Owing to titanium nitride (TiN) films has good chemical inertness, excellent heat resistance, wear resistance, corrosion resistance and excellent conductivity, it has attracted more attention from researchers and used as potential gate metal–oxide–semiconductor (MOS) in electronic devices and various surface coatings to extend the working life of the instruments [1–3]. Meanwhile, TiN films exhibited unique optical properties including the color and luster of the titanium nitride films vary with the proportion of N/Ti atoms and when the proportion of N/Ti atoms is 1, the color and luster of TiN films showed gold color [4–6]. Therefore, it has a wide application prospect in the field of architectural decoration and used as a decorative film, such as building glass or ceramic tile, mirror stainless steel plate and sanitary ware. Some studies had proved that the optical and electrical properties of the film are closely related to the * Dingyu Yang [email protected] 1
College of Optoelectronic Technology, Chengdu University of Information Technology, Chengdu 610225, People’s Republic of China
College of Intelligent Manufacturing, Sichuan University of Arts and Science, Dazhou 635002, People’s Republic of China
2
surface morphology, crystalline quality, preferred orientation, and internal stress of the films [7, 8]. Consequently, the preparation of high quality films is the basic premise to promote its wide application. The direct-current (DC) reaction magnetron sputtering is a good choice to prepare TiN films, because of low gaseous contamination, compositional homogeneity throughout the deposition and strong adherence between the deposited film and the substrate [9–11]. Moreover, films with different components can be
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