Investigation of Characteristics of Multi-Function ZnO Thin Film Deposited with Various Argon and Oxygen Ratios
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1174-V09-05
Investigation of Characteristics of Multi-Function ZnO Thin Film Deposited with Various Argon and Oxygen Ratios Che-Wei Hsu1, Tsung-Chieh Cheng2, Chun-Hui Yang3, Yi-Ling Shen3, Jong-Shin Wu1*, ShengYao Wu 2, Wen-Hsien Huang3 1 Department of Mechanical Engineering, National Chiao Tung University, 1001 Ta-Hsueh Road, Hsinchu 30050, Taiwan 2 Department of Mechanical Engineering, National Kaohsiung University of Applied Science, 415 Chien Kung Road, Kaohsiung 807, Taiwan 3 National Nano Device Laboratories, No. 26, Prosperity Road I, Science-based Industrial Park, Hsinchu 30078, Taiwan ABSTRACT The ZnO thin film was deposited on a glass substrate at RT by the RF reactive magnetron sputtering method. Structural, chemical, optical, and hydrophilic/hydrophobic properties are measured by using a surface profilometer, an x-ray diffractometry (XRD), an x-ray photoelectron spectroscopy (XPS), a UV-VIS spectrophotometer, and a contact angle system, respectively. Results show that the deposition rate decreases with increasing O2/(Ar+O2) ratio. In additiion, the best stoichiometric and quality of ZnO thin film was observed at 0.30 of O2/(Ar+O2) ratio, which shows the smallest FWHM and the strongest O-Zn strength. Regardless of O2/(Ar+O2) ratio effect or thickness effect, high transmittance (> 86%) in the visible region is observed, while the UV-shielding characteristics depend upon both the magnitude of film thickness. The film thickness plays a more prominent role in controlling optical properties, especially in the UV-shielding characteristics, than the O2/(Ar+O2) ratio. However, the hydrophobic characteristics can be obtained when the glass coating with ZnO thin films. In general, with properly coated ZnO thin film, we can obtain a glass substrate which is highly transparent in the visible region, has good UV-shielding characteristics, and possesses highly hydrophobic characteristics (self-clean capability), which is highly suitable for applications in the glass industries. INTRODUCTION In recent years, ZnO is one of the promising candidate materials which has been extensively investigated for various applications in many fields, such as optoelectronics [1-2], piezoelectric [3], and energy & environment [4-5], to name a few. Wide applications of ZnO thin film arise from several unique material properties. Therefore, ZnO is considered as one of the most interesting semiconductors of II–VI compounds. ZnO films have been grown by various deposition methods, such as sputtering [6-7], chemical bath deposition (CBD), spray pyrolysis, pulsed laser deposition (PLD), and metal organic chemical vapor deposition (MOCVD). However, understanding of the relationship between thin-film properties and plasma properties should greatly help to produce high-quality ZnO thin film in sputtering technique. Overdosed ultraviolet (UV) irradiation has become a serious problem due to ozone depletion globally and causes damaging effects on human’s health. Hence, how to prevent the UV light from direct
contact with human while allow most of
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