Investigation of Titanium Aluminium Nitride (TiAlN): A Review

Titanium aluminium nitride (TiAlN) thin films are now commonly used as protective layer in various fields as these films have high thermal stability and sound corrosion resistance. Due to high hardness and wear resistance at elevated temperature, it is on

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Abstract Titanium aluminium nitride (TiAlN) thin films are now commonly used as protective layer in various fields as these films have high thermal stability and sound corrosion resistance. Due to high hardness and wear resistance at elevated temperature, it is one of the most important thin film coating material for cutting tools. Various deposition methods such as physical vapour deposition (PVD), chemical vapour deposition (CVD), sputtering technique, etc., are used by many researchers to synthesize TiAlN coatings. To analyse morphological, structural, and mechanical characteristics, various tests such as SEM, AFM, xrd, Raman, and nanoindentation have been carried out by many researchers. This paper basically summarizes the properties of TiAlN monolayer, nanolayer, and multilayer thin films. Keywords Titanium aluminium nitride Mechanical properties

 PVD  Microstructure

1 Introduction For past few decades, nitride coatings have been emerged as one of the hardest and high temperature-resistant material in mechanical and industrial components [1]. In the recent years, it has also been emerged as one of the very suitable material for medical implants [2]. Among a wide variety of materials used in various fields, titanium nitride (TiN) suited the most for most of the requirements, but this material S. Das (&) Department of Mechanical Engineering, Sikkim Manipal Institute of Technology, Majitar, Sikkim, India e-mail: [email protected] B. P. Swain Centre for Material Science and Nano Technology, Sikkim Manipal Institute of Technology, Majitar, Sikkim, India e-mail: [email protected] © Springer Nature Singapore Pte Ltd. 2018 A. Kalam et al. (eds.), Advances in Electronics, Communication and Computing, Lecture Notes in Electrical Engineering 443, https://doi.org/10.1007/978-981-10-4765-7_16

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is subjected to oxidation at high temperature. To overcome this problem, aluminium is mixed into the TiN network to form TiAlN coatings which in the last few years have shown improvement in the quality of films [3]. One of the most important properties which TiAlN possesses is its resistance to oxidation at high temperature up to 700–800 °C, which in case of titanium nitride with NaCl structure, undergoes oxidation at around 500 °C.

1.1

Titanium Aluminium Nitride

Nowadays, single-layer and multilayer TiAlN coatings are intensively investigated due to its sound mechanical and tribological properties which make this a suitable coated material for cutting hard materials with good degree in accuracy. TiAlN is a face-centred cubic (fcc) crystal system commonly used as cutting tool, forming tools, semiconductor devices, etc. The main advantage of TiAlN films is high adhesion strength and thick layer of Al2O3 film which prevents oxygen diffusion in the coated film [4].

2 Morphology of TiAlN 2.1

Atomic Force Microscopy (AFM)

Khlifi et al. deposited and characterized different layers of TiN and TiAlN coatings on steel substrate via magnetron sputtering system. Characterization through AFM led th