Ion Beam Deposition of Diamond-Like Coatings
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ION BEAM DEPOSITION OF DIAMOND-LIKE COATINGS* ANTON C. GREENWALD, JAMES K. HIRVONEN and NARENDRA K. JAGGI** Spire Corporation, Redford, MA 01730 Northeastern University, Boston, MA 02115 ABSTRACT Mass analyzed and non-mass analyzed carbon ion beams were used to Extremely, hard dense deposit coatings on polished silicon wafers. coatings that are structurally similar to i-carbon as determined by Ramon spectroscopy were achieved with high current beams of methane and argon. Residual contaminants of oxygen and nitrogen were minimized. INTRODUCTION The objective of this research was to investigate ion beam deposition of carbon as a method to deposit diamond and diamond-like coatings with superior electrical and optical properties. Ion beam assisted deposition typically introduces compressive stresses It is believed that this can change the normally into the film [1]. observed amorphous structure of carbon films deposited by plasma assisted means into diamond if the hydrogen content can be reduced. Achievement of alianed crystal structure would allow use of the films for electronic d#vices. Improved transmission in the visible region of the spectrum would allow use of such films for protective coatings on optics. EXPERIMENTAL RESULTS Mass analyzed carbon ion films were deposited in a modified end station of a Varian-Extrion 200-1000 ion implanter. An electrostatic lens was used The to decrease ion energy to 100 eV to reduce sputtering effects. deposition rate was very slow, and chemical analysis by ESCA showed that We resulting films were heavily contaminated by oxygen and nitrogen. concluded that the use of a mass analyzed beam to improve the purity of the For a more film is not justified without ultra-high vacuum conditions. practical approach to film deposition, and to reduce the relative background contamination effect, ion beam current density on the substrate had to be increased. A summary of the different techniques tested to deposit diamond films with non-mass analyzed ion beams are summarized in Table I. They include direct ion beam deposition (IBD) of methane (CH4 +) as well as IBD of a combined argon and methane beam (Ar+ plus CH4 +), and finally Ion Ream Enhanced (assisted) Deposition (IBED) of evaporated carbon films. The purpose of the argon was twofold; to help sustain the ion source as well as to provide nuclear energy loss in the deposition to promote more thermal spikes or displacement collisions thought responsible for creating the local "hiqh-temperature," high-pressure regions necessary to form diamondlike films. wthis research was funded by the U.S. Research contract number DAAL03-87-C-0028.
Mat. Res. Soc. Symp. Proc. Vol. 128. ©1989 Materials Research Society
Army Research Office Innovative
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