Large Scale Engineered Nanostructured Surfaces by Reactive Ion Etching with Kinetically Self-Assembled Non-continuous Me
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Large Scale Engineered Nanostructured Surfaces by Reactive Ion Etching with Kinetically Self-Assembled Non-continuous Metal Film as Etching Mask Wei Wei1 ,3, Mark Bachman2,3, and Guann-Pyng Li1,2,3 1. Department of Chemical Engineering and Materials Science 2. Department of Electrical Engineering and Computer Science 3. Integrated Nanosystems Research Facilities, Henry Samueli School of Engineering University of California, Irvine Irvine, California 92697
ABSTRACT In this study, we explored the possibility of using annealed non-continuous metal film enabled etching technique to produce large nano-structured surfaces. Non-continuous Ag film is deposited on silicon wafer with a thin layer of silicon dioxide using E-beam deposition, and then vacuum thermal annealing was applied on the deposited films, causing nano-scaled Ag particles to migrate and agglomerate into self-assembled islands of larger nanometer dimensions. We controlled the density and average size of the metal islands through thickness of the initial film and subsequent annealing rates. Reactive ion etching through the metal islands mask into the underneath silicon dioxide layer was performed following the annealing process. Preliminary hydrophobicity experiments were carried out using the engineered nano-structured surfaces. INTRODUCTION The fabrication of nano-structured surfaces of different materials is of broad interest in recent years not only because of its fundamental aspects but also because of a variety of potential applications that may be enabled. In microfuidic systems, surface properties strongly affect flow resistance since the surface-to-volume ratio is huge under this scenario. Nanostructured surfaces with certain degree of roughness were found to be surprisingly effective in reducing the surface friction and leading to a “water repellent” surface [1,2]. Nanopatterned surfaces also found innovative applications in recording cellular activities [3], protein recognition [4], which are the fundamental aspects for the future disease diagnosing and biological sensing. Another area that nanopatterned structures are finding increasingly important applications is the semiconductor quantum devices fabrication. Ordered arrays of silicon nanopillars and nanopoles [5-7] structures as field emission centers are explored since the discovery of strong visible photoluminescence from porous silicon by Canham [8]. Different techniques have been developed to obtain nanostructured surfaces in the last few years [9-13], such as swift heavy ion (SHI) irradiation [9] and spray deposition of nanoscale metal particles [10], anodization of aluminum thin film [11], polystyrene as metal deposition mask [7] and low power plasma with the presence of aluminum leads to the formation of AlF3 as natural mask [5]. Nano-structured surfaces from size-selected clusters [12, 1], and e-beam lithography [13]. However, how to generate a large area of nanostructured surface for practical applications in a cost-effective manner is still a challenging issue. It is well und
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