Magnetic Nanostructures Produced By Electron Beam Direct Writing
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uctures Produced By Electron Beam Direct Writing J.P. Wang, Y. Zhao, T.J. Zhou, J.T.L. Thong and T.C. Chong MRS Proceedings / Volume 777 / 2003 DOI: 10.1557/PROC777T4.13
Link to this article: http://journals.cambridge.org/abstract_S1946427400139260 How to cite this article: J.P. Wang, Y. Zhao, T.J. Zhou, J.T.L. Thong and T.C. Chong (2003). Magnetic Nanostructures Produced By Electron Beam Direct Writing. MRS Proceedings,777, T4.13 doi:10.1557/PROC777T4.13 Request Permissions : Click here
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Mat. Res. Soc. Symp. Proc. Vol. 777 © 2003 Materials Research Society
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Magnetic Nanostructures Produced By Electron Beam Direct Writing J.P. Wang1, 2, Y. Zhao2, T.J. Zhou2, J.T.L. Thong3, and T.C. Chong2 Dept. of Electrical and Computer Engineering, The Center for Micromagnetics and Information Technologies (MINT), University of Minnesota, MN 55455-0154 2 Data Storage Institute, DSI building, 5 Engineering Drive 1, Singapore, 117608 3 Center for IC Failure Analysis and Reliability (CICFAR), Faculty of Engineering, National University of Singapore, Singapore
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ABSTRACT We present a method of direct magnetic patterning of nonmagnetic CoC and CoTaC films by electron irradiation-induced nano-scale phase transition. CoxC1-x (0.4
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